Listed by the USPTO as NIA, ALIREZA
Tech Center 3700 • Art Units: 3739 3772 3779 3786 3794
This examiner grants 42% of resolved cases
Alireza Nia is an examiner in Tech Center 3700 and Art Unit 3739 with 458 resolved cases. The allowance rate of 41.7 percent is relatively low, suggesting a challenging prosecution environment. The median days to allowance of 1497 indicates that successful applications require significant time and effort. These figures suggest that applicants should be prepared for a rigorous and potentially lengthy examination process.
The interview lift of 49.5 percent is a critical figure, as it shows that interviews nearly double the chances of overcoming rejections. This high lift value indicates that the examiner is very receptive to resolving issues through direct dialogue. University of Central Florida Research Foundation Inc. and Arctic Shower LLC are among the top companies in this docket. Firms like Barron & Young PLLC and Leason Ellis LLP are frequently involved in these 458 resolved cases, utilizing the 49.5 percent lift to navigate the 1497-day median timeline and the 41.7 percent allowance rate.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19040657 | SYSTEM AND METHOD FOR TREATING OVER-ACTIVE BLADDER | Final Rejection | The Alfred E. Mann Foundation for Scientific Research |
| 18638281 | HOT/COLD BREAST PACK | Final Rejection | FRIDABABY, LLC |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy41.7% of resolved applications examined by Alireza Nia were allowed (458 resolved cases), compared with 0.0% across Art Unit 3739 over the last five years.
This examiner's interview lift is +49.5 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Alireza Nia took 1,497 days on average from filing to allowance.
Alireza Nia examines applications in Art Unit 3739 in Tech Center 3700 (Medical Devices & Mechanical Engineering).