Listed by the USPTO as RICKEL, ALEX PARK
Tech Center 2800 • Art Units: 2872 2881 2898
This examiner grants 72% of resolved cases
RICKEL, ALEX PARK is a USPTO patent examiner in tech center 2800 and art unit 2872. The profile contains 57 resolved cases, an allowance rate of 71.9%, and a median of 1153 days to allowance. The limited record supports an initial directional assessment rather than a complete characterization of prosecution behavior. The allowance rate shows that allowances are a substantial portion of outcomes, while the median indicates a lengthy path to allowance.
The interview lift is 14.9%, suggesting that interviews have a meaningful but not dominant association with allowance outcomes here. Meta Platforms Technologies LLC, Samsung Electro-Mechanics Co., Ltd., and Newmax Technology Co., Ltd. are the listed leading companies. Studebaker Brackett PLLC, Greenberg Traurig, LLP - Meta Platforms, Inc., and NSIP LAW are the listed leading firms. Practitioners can use interviews to address focused claim issues while planning around the 1153-day median.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18972741 | FINDER OPTICAL SYSTEM, FINDER DEVICE, AND IMAGING APPARATUS | Non-Final OA | FUJIFILM Corporation |
| 19070116 | LENS ASSEMBLY AND ELECTRONIC DEVICE COMPRISING SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 19225399 | OPTICAL SYSTEM AND IMAGING APPARATUS INCLUDING THE SAME | Final Rejection | CANON KABUSHIKI KAISHA |
| 18989338 | Electrophoretic Fluid, Electrophoretic Layer, Display Panel and Preparation Method Therefor, and Electronic Device | Non-Final OA | Huawei Technologies Co., Ltd. |
| 18989509 | OPTICAL ELEMENT DRIVING MECHANISM | Non-Final OA | Actutek Corporation |
| 18835092 | ELECTROMAGNETIC WAVE DEFLECTION DEVICE AND ELECTROMAGNETIC WAVE SCANNING DEVICE | Final Rejection | KYOCERA Corporation |
| 18390794 | EYE STRAIN REDUCTION IN HEAD MOUNTABLE DISPLAY | Final Rejection | Meta Platforms Technologies, LLC |
| 18359544 | WIDE FIELD OF VIEW (FOV) OPTICAL LENS ASSEMBLY WITH TUNABLE OPTICAL LENS | Non-Final OA | Meta Platforms Technologies, LLC |
| 18062205 | REFLECTIVE POLARIZER WITH INTEGRATED ANTI-REFLECTIVE COATING | Non-Final OA | Meta Platforms Technologies, LLC |
| 19008550 | LENS DRIVING DEVICE | Non-Final OA | AAC Microtech (Changzhou) Co., Ltd. |
| 18184962 | MOBILE ELECTRONIC DEVICE WITH LENS, AND LENS ASSEMBLY | Final Rejection | SAMSUNG ELECTRO-MECHANICS CO., LTD. |
| 18109333 | CAMERA MODULE WITH OPTICAL IMAGE STABILIZATION ACTUATOR | Non-Final OA | SAMSUNG ELECTRO-MECHANICS CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy71.9% of resolved applications examined by Alex Park Rickel were allowed (57 resolved cases), compared with 64.9% across Art Unit 2872 over the last five years.
This examiner's interview lift is +14.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Alex Park Rickel took 1,153 days on average from filing to allowance.
Alex Park Rickel examines applications in Art Unit 2872 in Tech Center 2800 (Semiconductors, Circuits & Optics).
