Listed by the USPTO as SHAH, NEEL D
Tech Center 2800 • Art Units: 2857 2858 2868 2877
This examiner grants 87% of resolved cases
SHAH, NEEL D is assigned to Tech Center 2800 and Art Unit 2857, with 634 resolved cases. The allowance rate is 86.9%, and the median time to allowance is 851 days. The interview lift is 7.7%, indicating a modest association between interviews and allowance outcomes. No art unit allowance or pendency baseline is supplied, so the profile is most useful for examiner-specific expectation setting.
The leading companies are Samsung Electronics Co., Ltd., Sony Group Corporation, and Panasonic Holdings Corporation. The principal firms are BACHMAN & LAPOINTE, P.C., CANTOR COLBURN LLP, and K&L Gates LLP. Applicants can approach this docket with a favorable allowance expectation while recognizing that interviews show limited incremental association in the available record. Strong initial claim drafting and focused written responses remain practical priorities.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19019859 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18781532 | SENSOR DEVICE, WATER AMOUNT MEASUREMENT DEVICE, WATER AMOUNT MEASUREMENT METHOD, INFORMATION PROCESSING DEVICE, AND INFORMATION PROCESSING METHOD | Final Rejection | SONY SEMICONDUCTOR SOLUTIONS CORPORATION |
| 18846860 | BATTERY STATE ANALYSIS SYSTEM, BATTERY STATE ANALYSIS METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | Non-Final OA | Panasonic Intellectual Property Management Co., Ltd. |
| 18973509 | ELECTRONIC DEVICE AND IMPEDANCE MEASUREMENT METHOD | Non-Final OA | InnoLux Corporation |
| 18951660 | INSPECTION METHOD AND ENERGY STORAGE SYSTEM | Non-Final OA | Contemporary Amperex Technology (Hong Kong) Limited |
| 18790492 | SYSTEM AND METHOD FOR MEASURING DEVICE INSIDE THROUGH-SILICON VIA SURROUNDINGS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18960502 | Quality control method for a cable specimen | Non-Final OA | NEXANS |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy86.9% of resolved applications examined by Neel D Shah were allowed (634 resolved cases), compared with 72.0% across Art Unit 2857 over the last five years.
This examiner's interview lift is +7.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Neel D Shah took 851 days on average from filing to allowance.
Neel D Shah examines applications in Art Unit 2857 in Tech Center 2800 (Semiconductors, Circuits & Optics).
