Prosecution Insights
Last updated: October 26, 2026

Rhys Poniente Sheker, USPTO Patent Examiner

Listed by the USPTO as SHEKER, RHYS PONIENTE

Tech Center 2800 • Art Units: 2813

This examiner grants 84% of resolved cases

Analysis

Rhys Poniente Sheker is in Art Unit 2813 of Tech Center 2800. The examiner has 71 resolved cases and an 84.5 percent allowance rate. This 84.5 percent allowance rate is higher than the interview lift of 6.8 percent. The median time to allowance is 1229 days.

The interview lift of 6.8 percent indicates the increase in allowance probability when an interview occurs. Practitioners can use the 1229 median days to allowance to estimate the time required for a patent to issue. The 84.5 percent allowance rate reflects the examiner's historical tendency to grant applications in Art Unit 2813. These 71 resolved cases provide the data for Tech Center 2800.

Sharp Corporation, LG Display Co., Ltd., and Wuhan Xinxin Semiconductor Manufacturing Co., Ltd. are top companies. Akona IP PC - Intel, Butzel Long, and Chip Law Group are the leading firms. These firms have managed cases within the 71 resolved cases and the 84.5 percent allowance rate.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

84.5%
Allow Rate
+16.5% vs TC avg
111
Total Applications
+6.8%
Interview Lift
1229
Avg Prosecution Days
Based on 71 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
21.2%
§102 Novelty
60.8%
§103 Obviousness
18.1%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18235092 DISPLAY DEVICE AND DISPLAY PANEL Final Rejection LG DISPLAY CO., LTD.
17954935 DISPLAY DEVICE Non-Final OA LG DISPLAY CO., LTD.
18450202 DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE Final Rejection Samsung Display Co., LTD.
18039278 Display Substrate, Display Device and Manufacturing Method of Display Substrate Final Rejection BOE Technology Group Co., Ltd.
18390766 SELECTIVE DEEP RECESS SOURCE/DRAIN STRUCTURE FOR DIRECT BACKSIDE POWER RAIL CONTACT Non-Final OA QUALCOMM Incorporated
18066301 SERIAL DIRECTED SELF-ASSEMBLY (DSA) PROCESSES FOR FORMING METAL LAYER WITH CUT Non-Final OA Intel Corporation
18273067 DISPLAY APPARATUS, DISPLAY MODULE, AND ELECTRONIC DEVICE Non-Final OA SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
18015038 LIGHT-EMITTING DEVICE AND METHOD OF PRODUCING LIGHT-EMITTING DEVICE Final Rejection SHARP KABUSHIKI KAISHA
17928277 LIGHT-EMITTING ELEMENT AND DISPLAY DEVICE Non-Final OA SHARP KABUSHIKI KAISHA
17912495 LIGHT-EMITTING DEVICE Non-Final OA SHARP KABUSHIKI KAISHA
18822604 BACKSIDE CONTACT WITHOUT RX LINER Non-Final OA International Business Machines Corporation
18473861 SELECTIVE AND SELF-ALIGNED SOI THINNING FOR RF SWITCH APPLICATIONS Final Rejection STMicroelectronics International N.V.
17554511 INTEGRATED ELECTRONICS ON THE ALUMINUM NITRIDE PLATFORM Final Rejection CORNELL UNIVERSITY

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Frequently Asked Questions

What is examiner Rhys Poniente Sheker's allowance rate?

84.5% of resolved applications examined by Rhys Poniente Sheker were allowed (71 resolved cases), compared with 80.3% across Art Unit 2813 over the last five years.

Does an interview help with examiner Rhys Poniente Sheker?

This examiner's interview lift is +6.8 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Rhys Poniente Sheker take to allow a patent?

Applications allowed by Rhys Poniente Sheker took 1,229 days on average from filing to allowance.

Which art unit does examiner Rhys Poniente Sheker work in?

Rhys Poniente Sheker examines applications in Art Unit 2813 in Tech Center 2800 (Semiconductors, Circuits & Optics).

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