Listed by the USPTO as SONG, MATTHEW J
Tech Center 2800 • Art Units: 1714 1783 1784 1792 2891
This examiner grants 60% of resolved cases
SONG, MATTHEW J is assigned to tech center 2800 and art unit 1714. The profile records 919 resolved cases, an allowance rate of 60.4%, and a median of 1342 days to allowance. The substantial case history supports using the record for examiner-specific planning, while the allowance rate reflects a prosecution environment where claim development may require sustained attention.
Interviews are associated with a 13.9% lift in allowance rate. Applied Materials Inc., Sumitomo Electric Industries Ltd., and Globalwafers Co., Ltd. are the leading companies listed. The principal firms are COLLARD & ROE, P.C., RENNER, OTTO, BOISSELLE & SKLAR, LLP, and Abel Schillinger, LLP. The timing figure also supports early attention to prosecution sequencing.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17288362 | CRYSTAL, METHOD OF PRODUCING CRYSTAL, AND METHOD OF SELF-ORGANIZING SILANOL COMPOUND | Final Rejection | National Institute of Advanced Industrial Science and Technology |
| 18703652 | SILICON CARBIDE SUBSTRATE AND METHOD OF MANUFACTURING SILICON CARBIDE SUBSTRATE | Non-Final OA | DENSO CORPORATION |
| 18873715 | METHOD FOR PREPARING FULLERENE SINGLE-CRYSTAL FILMS AND USES FIELD OF TECHNOLOGY | Non-Final OA | ZHEJIANG UNIVERSITY |
| 18293861 | METHOD FOR PRODUCING COATED SUBSTRATES, COATED SUBSTRATE, AND USE THEREOF | Non-Final OA | FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
| 18569005 | SYNTHETIC SINGLE CRYSTAL DIAMOND AND METHOD FOR PRODUCING THE SAME | Final Rejection | SUMITOMO ELECTRIC INDUSTRIES, LTD. |
| 18283790 | SINGLE-CRYSTAL DIAMOND AND METHOD OF MANUFACTURING THE SAME | Final Rejection | SUMITOMO ELECTRIC INDUSTRIES, LTD. |
| 18122989 | GROUP III NITRIDE SUBSTRATE AND METHOD OF MAKING | Non-Final OA | Kyocera Corporation |
| 18614826 | LOW-TEMPERATURE ETCHANT-FREE SELECTIVE EPITAXY OF N-TYPE DOPED SILICON | Non-Final OA | Applied Materials, Inc. |
| 18590572 | LOW TEMPERATURE ATMOSPHERIC EPITAXIAL PROCESS | Final Rejection | Applied Materials, Inc. |
| 18516728 | LOW TEMPERATURE EPI CHAMBER | Non-Final OA | Applied Materials, Inc. |
| 18100978 | METHOD FOR CONTROLLING LAYER-TO-LAYER THICKNESS IN MULTI-TIER EPITAXIAL PROCESS | Final Rejection | Applied Materials, Inc. |
| 17457709 | Laser-Assisted Epitaxy and Etching for Manufacturing Integrated Circuits | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18555514 | INGOT GROWING APPARATUS | Non-Final OA | HANWHA SOLUTIONS CORPORATION |
| 18738193 | MANAGING THE GROWTH OF SILICON CARBIDE CRYSTALS | Non-Final OA | SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC |
| 18348533 | METHOD AND APPARATUS FOR PROCESSING A SINGLE CRYSTAL BLANK | Non-Final OA | DISCO CORPORATION |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy60.4% of resolved applications examined by Matthew J Song were allowed (919 resolved cases), compared with 50.6% across Art Unit 1714 over the last five years.
This examiner's interview lift is +13.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Matthew J Song took 1,342 days on average from filing to allowance.
Matthew J Song examines applications in Art Unit 1714 in Tech Center 2800 (Semiconductors, Circuits & Optics).
