Tech Center 2800 • Art Units: 1722 1795 2896 2899
This examiner grants 88% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18210374 | MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT BY USING EXTREME ULTRA VIOLET | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18455231 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE | Non-Final OA | FUJIFILM Corporation |
| 18449475 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES | Non-Final OA | FUJIFILM Corporation |
| 18362376 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18359391 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | Non-Final OA | FUJIFILM Corporation |
| 18175870 | METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18059304 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | Final Rejection | FUJIFILM Corporation |
| 18047304 | METHOD FOR PRODUCING SHAPED OBJECT, METHOD FOR PRODUCING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18133945 | PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18123095 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18165759 | SELECTIVE HARDMASK ON HARDMASK | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18239301 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER | Non-Final OA | SAMSUNG SDI CO., LTD. |
| 18155545 | SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | Non-Final OA | Samsung SDI Co., Ltd. |
| 18341828 | APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE | Non-Final OA | SEMES CO., LTD. |
| 18262451 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING HOLLOW STRUCTURE | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18156580 | UNDERLAYER COMPOSITION FOR PHOTOLITHOGRAPHY, MULTILAYERED STRUCTURE FORMED USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | Non-Final OA | Inha University Research and Business Foundation |
| 18156899 | METHOD FOR STORING DATA AND OPTICAL STORAGE | Final Rejection | The Chinese University of Hong Kong |
| 18241904 | Method for coating top anti-reflective coating | Non-Final OA | United Semiconductor (Xiamen) Co., Ltd. |
| 18451607 | BLANK MASK AND PHOTOMASK USING THE SAME | Non-Final OA | SK enpulse Co., Ltd. |
| 18276760 | METHODS AND APPARATUS FOR RUTHENIUM OXIDE REDUCTION ON EXTREME ULTRAVIOLET PHOTOMASKS | Non-Final OA | APPLIED MATERALS, INC. |
| 17913389 | METHOD AND APPARATUS FOR LITHOGRAPHY-BASED GENERATIVE MANUFACTURING OF A THREE-DIMENSIONAL COMPONENT | Final Rejection | UPNANO GMBH |
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