Listed by the USPTO as TADESSE, YEWEBDAR T
Tech Center 2800 • Art Units: 1712 1713 1714 1715 1717 1718 1736 1786 1792 1798
This examiner grants 81% of resolved cases
TADESSE, YEWEBDAR T works in Tech Center 2800 and art unit 1712. Across 1216 resolved cases, the profile shows an 81.4% allowance rate and a 19.1% interview lift. The median time to allowance is 1027 days. The substantial record supports using these figures for forecasting, with interviews serving as a potentially useful part of a response and examiner-engagement strategy.
The leading companies are Tokyo Electron Limited, Samsung Display Co., Ltd., and Samsung Electronics Co., Ltd. The associated firms are CANTOR COLBURN LLP, Buchanan Ingersoll & Rooney PC, and CARTER, DELUCA & FARRELL LLP. The client mix indicates semiconductor and display technology experience in the docket.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18661139 | HOME PORT, SUBSTRATE TREATING APPARATUS, AND METHOD FOR DISCHARGING CHEMICAL SOLUTION | Non-Final OA | SAMSUNG ELECTRONICS CO, LTD. |
| 18631220 | MASK ASSEMBLY AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | Samsung Display Co., Ltd. |
| 18609717 | MASK ASSEMBLY AND MANUFACTURING METHOD OF THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18842187 | COATING DEVICE AND METHOD FOR PRODUCING WEB WITH COATING FILM | Non-Final OA | Toray Industries, Inc. |
| 18073822 | MIST GENERATOR, THIN FILM MANUFACTURING DEVICE, AND THIN FILM MANUFACTURING METHOD | Final Rejection | NIKON CORPORATION |
| 18540725 | COATING DEVICE, COATING FILM, AND COATING METHOD | Final Rejection | KYOCERA CORPORATION |
| 18436041 | MAINTENANCE APPARATUS, LIQUID DISCHARGE APPARATUS, AND MAINTENANCE METHOD | Final Rejection | RICOH COMPANY, LTD. |
| 19033032 | COATING FILM FORMING METHOD, COATING FILM FORMING APPARATUS, AND STORAGE MEDIUM | Non-Final OA | Tokyo Electron Limited |
| 18025250 | RAW MATERIAL SUPPLY DEVICE AND RAW MATERIAL SUPPLY METHOD | Final Rejection | Tokyo Electron Limited |
| 18521726 | ADJUSTABLE NOZZLE DEVICE | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18834299 | VAPOR DEPOSITION MASK, FRAMED VAPOR DEPOSITION MASK, METHOD OF MANUFACTURING VAPOR DEPOSITION MASK, METHOD OF MANUFACTURING ORGANIC DEVICE, AND METHOD OF MANUFACTURING FRAMED VAPOR DEPOSITION MASK | Non-Final OA | DAI NIPPON PRINTING CO., LTD. |
| 18588105 | METHOD OF COOLING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE COOLING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 19213690 | Electrospinning Apparatus and Uses Thereof | Non-Final OA | University of Connecticut |
| 18580260 | SAUCE GLAZING APPARATUS AND APPLICATION METHOD | Non-Final OA | Cargill, Incorporated |
| 18739684 | APPARATUS FOR TREATING SUBSTRATE | Non-Final OA | SEMES CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy81.4% of resolved applications examined by Yewebdar T Tadesse were allowed (1,216 resolved cases), compared with 43.3% across Art Unit 1712 over the last five years.
This examiner's interview lift is +19.1 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Yewebdar T Tadesse took 1,027 days on average from filing to allowance.
Yewebdar T Tadesse examines applications in Art Unit 1712 in Tech Center 2800 (Semiconductors, Circuits & Optics).
