Listed by the USPTO as TRAYWICK, ANDREW PRESTON
Tech Center 4100 • Art Units: 1737 2899 4100
This examiner grants 72% of resolved cases
TRAYWICK, ANDREW PRESTON is assigned to tech center 4100 and art unit 1737. The profile records 128 resolved cases, an allowance rate of 71.9%, and a median of 1152 days to allowance. The limited case history warrants measured use of the figures, while the observed timing suggests that applicants should account for an extended prosecution path.
The interview lift is 26.9%, supporting interviews as one practical tool for addressing examination issues. The listed companies are SUMITOMO CHEMICAL Company, Limited, Shin-Etsu Chemical Co., Ltd., and Tokyo Ohka Kogyo Co., Ltd. The listed firms are FITCH EVEN TABIN & FLANNERY, LLP, PANITCH SCHWARZE BELISARIO & NADEL LLP, and Knobbe, Martens, Olson & Bear, LLP.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18185115 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18615901 | METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17813704 | PHOTOSENSITIVE RESIN COMPOSITION, SHAPED PRODUCT, METHOD FOR MANUFACTURING SHAPED PRODUCT AND METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD | Final Rejection | CANON KABUSHIKI KAISHA |
| 18147535 | METHODS, SYSTEMS, APPARATUS, AND ARTICLES OF MANUFACTURE TO PRODUCE INTEGRATED CIRCUIT PACKAGES HAVING SILICON NITRIDE ADHESION PROMOTERS | Non-Final OA | Intel Corporation |
| 18358150 | Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patterning Process | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 17984448 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | Final Rejection | Shin-Etsu Chemical Co., Ltd. |
| 18415986 | Extreme Ultraviolet (EUV) Mask and Method of Fabrication Thereof | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18687180 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED CIRCUIT BOARD, AND METHOD FOR MANUFACTURING PRINTED CIRCUIT BOARD | Non-Final OA | Resonac Corporation |
| 18190207 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Non-Final OA | Sumitomo Chemical Company, Limited |
| 18124180 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Non-Final OA | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 17977185 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Non-Final OA | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 17896138 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Final Rejection | SUMITOMO CHEMICAL COMPANY, LIMITED |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy71.9% of resolved applications examined by Andrew Preston Traywick were allowed (128 resolved cases), compared with 63.4% across Art Unit 1737 over the last five years.
This examiner's interview lift is +26.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Andrew Preston Traywick took 1,152 days on average from filing to allowance.
Andrew Preston Traywick examines applications in Art Unit 1737 in Tech Center 4100.
