Technology area: Chemistry & Materials
42 pending office actions • 15 art units • 32 examiners • 0 of 42 (0%) have an AI response strategy ready • 34 patents granted in the last 365 days
Tokyo Ohka Kogyo Co., Ltd. has 44 pending office actions in Chemistry & Materials. The matters involve 33 examiners across 16 art units, showing a substantial prosecution footprint with broad examiner coverage and repeated activity within the art units.
EOFF, ANCA is the busiest examiner, with 3 pending matters. This creates a defined opportunity to compare prosecution positions in that examiner’s cases, although most of the docket is distributed among other examiners. Counsel should coordinate chemistry and materials claim themes across the 16 art units, while preserving art-unit-specific treatment of prior art, technical effect, and claim amendments.
Based on the USPTO statutory response window for each pending office action. 8 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 8 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 16 (38%) |
| §102 only | 7 (17%) |
| Multi-statute (no §101) | 19 (45%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| CHAMPION, RICHARD DAVID | 3 | 46.2% | +11.1% |
| AHMED, SHAMIM | 2 | 78.5% | +22.1% |
| TRAYWICK, ANDREW PRESTON | 2 | 71.9% | +26.9% |
| EOFF, ANCA | 2 | 80.1% | +10.8% |
| MALLOY, ANNA E | 2 | 46.7% | -4.0% |
| SULLIVAN, CALEEN O | 2 | 88.7% | +11.4% |
| COSGROVE, JAYSON D | 2 | 53.0% | +33.9% |
| ROSWELL, JESSICA MARIE | 2 | 52.1% | +36.4% |
| CHU, JOHN S Y | 2 | 76.8% | +5.4% |
| LISTVOYB, GREGORY | 1 | 66.9% | +29.4% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18575649 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | SULLIVAN, CALEEN O | — |
| 18563359 | RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD | SULLIVAN, CALEEN O | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18179942 | RADIATION SHEET, HEAT DISSIPATION PLATE, HEAT DISSIPATION DEVICE AND CURABLE PASTE | FREEMAN, JOHN D | 8d overdue |
| 17777382 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | CHAMPION, RICHARD DAVID | 79d |
| 17996704 | RADIO WAVE ABSORBER AND PASTE FOR FORMING RADIO WAVE ABSORBER | STANLEY, JANE L | 83d |
| 19058242 | PROCESSING SOLUTION, METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | BERGNER, ERIN FLANAGAN | — |
| 18993156 | PROTECTIVE FILM FORMATION AGENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP | AHVAZI, BIJAN | — |
| 18930500 | METHOD FOR PRODUCING STRUCTURE HAVING PHASE-SEPARATED STRUCTURE | HERNANDEZ-KENNEY, JOSE | — |
| 18924422 | PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | AHMED, SHAMIM | — |
| 18730248 | WATER-REPELLING AGENT FOR ELECTROCONDUCTIVE ARTICLE SURFACE, WATER-REPELLENCY-IMPARTING METHOD FOR ELECTROCONDUCTIVE ARTICLE SURFACE, METHOD FOR SELECTIVELY IMPARTING WATER REPELLENCY FOR REGION HAVING ELECTROCONDUCTIVE ARTICLE SURFACE, SURFACE TREATMENT METHOD, AND METHOD FOR FORMING FILM ON SELECTED REGION OF SUBSTRATE SURFACE | ABU ALI, SHUANGYI | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17805188 | CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVICE, METHOD OF PRODUCING SUBSTRATE FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | COSGROVE, JAYSON D | 28d |
| 17754247 | NEGATIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIST FILM, PATTERN FORMATION METHOD, CURED FILM, CURED FILM PRODUCTION METHOD, AND ROLLED BODY | CHAMPION, RICHARD DAVID | 42d |
| 18339644 | CURABLE COMPOSITION | ROSWELL, JESSICA MARIE | 47d |
| 17777382 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | CHAMPION, RICHARD DAVID | 79d |
| 19241027 | BASE MATERIAL AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE-SEPARATED STRUCTURE | LISTVOYB, GREGORY | — |
| 18924422 | PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | AHMED, SHAMIM | — |
| 18924413 | PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | AHMED, SHAMIM | — |
| 18699225 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TRAYWICK, ANDREW PRESTON | — |
| Art Unit | Apps |
|---|---|
| 1737 | 12 |
| 1713 | 4 |
| 1767 | 4 |
| 1717 | 3 |
| 1761 | 3 |
| 1764 | 3 |
| 1722 | 3 |
| 1766 | 2 |
| 2899 | 2 |
| 1765 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19241027 | BASE MATERIAL AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE-SEPARATED STRUCTURE | LISTVOYB, GREGORY | 1765 | §102 | Non-Final OA | — | Pending | Jun 17, 2025 |
| 19124533 | METHOD FOR MANUFACTURING PROCESSED SUBSTRATE, METHOD FOR PROCESSING SUBSTRATE, PATTERN FORMATION METHOD, AND CLEANING LIQUID | DAGENAIS, KRISTEN A | 1717 | §103 | Non-Final OA | — | Pending | Apr 25, 2025 |
| 19062493 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, LOWER LAYER FILM, METHOD FOR PRODUCING STRUCTURE HAVING PHASE-SEPARATED STRUCTURE, AND COMPOUND | KAHN, RACHEL | 1766 | §102 | Non-Final OA | — | Pending | Feb 25, 2025 |
| 19058242 | PROCESSING SOLUTION, METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | BERGNER, ERIN FLANAGAN | 1713 | §102§103 | Non-Final OA | — | Pending | Feb 20, 2025 |
| 18993156 | PROTECTIVE FILM FORMATION AGENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP | AHVAZI, BIJAN | 1763 | §102§103Other | Non-Final OA | — | Pending | Jan 10, 2025 |
| 18940071 | SURFACE TREATMENT AGENT, SURFACE TREATMENT METHOD, AND AREA-SELECTIVE FILM FORMING METHOD ON SUBSTRATE SURFACE | WALTERS JR, ROBERT S | 1717 | §103 | Non-Final OA | — | Pending | Nov 07, 2024 |
| 18930500 | METHOD FOR PRODUCING STRUCTURE HAVING PHASE-SEPARATED STRUCTURE | HERNANDEZ-KENNEY, JOSE | 1717 | §102§103 | Non-Final OA | — | Pending | Oct 29, 2024 |
| 18924422 | PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | AHMED, SHAMIM | 1713 | §103§112Other | Non-Final OA | — | Pending | Oct 23, 2024 |
| 18924413 | PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | AHMED, SHAMIM | 1713 | §103Other | Non-Final OA | — | Pending | Oct 23, 2024 |
| 18851962 | ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | LU, JIONG-PING | 1713 | §102 | Non-Final OA | — | Pending | Sep 27, 2024 |
| 18730248 | WATER-REPELLING AGENT FOR ELECTROCONDUCTIVE ARTICLE SURFACE, WATER-REPELLENCY-IMPARTING METHOD FOR ELECTROCONDUCTIVE ARTICLE SURFACE, METHOD FOR SELECTIVELY IMPARTING WATER REPELLENCY FOR REGION HAVING ELECTROCONDUCTIVE ARTICLE SURFACE, SURFACE TREATMENT METHOD, AND METHOD FOR FORMING FILM ON SELECTED REGION OF SUBSTRATE SURFACE | ABU ALI, SHUANGYI | 1731 | §102§112 | Final Rejection | — | Pending | Jul 18, 2024 |
| 18747824 | CLEANING SOLUTION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | MRUK, BRIAN P | 1761 | §102§103 | Final Rejection | — | Pending | Jun 19, 2024 |
| 18732471 | TREATMENT LIQUID | CULBERT, ROBERTS P | 1716 | §103 | Final Rejection | — | Pending | Jun 03, 2024 |
| 18712891 | PHOTOCURABLE COMPOSITION AND PATTERN FORMING METHOD | STONEHOCKER, VIRGINIA LEE | 1766 | §103Other | Non-Final OA | — | Pending | May 23, 2024 |
| 18699225 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TRAYWICK, ANDREW PRESTON | 1737 | §102§112 | Non-Final OA | — | Pending | Apr 05, 2024 |
| 18697720 | METHOD FOR PRODUCING ACID GENERATOR | BRADY, KRISTEN WEEKS | 1692 | §103§112 | Non-Final OA | — | Pending | Apr 01, 2024 |
| 18694174 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | NGUYEN, TRI V | 1764 | §102§103§112 | Non-Final OA | — | Pending | Mar 21, 2024 |
| 18694200 | PHOTOSENSITIVE COMPOSITION | EOFF, ANCA | 1722 | §102§103§112Other | Non-Final OA | — | Pending | Mar 21, 2024 |
| 18433969 | AQUEOUS CLEANING LIQUID | DELCOTTO, GREGORY R | 1761 | §103 | Non-Final OA | 44d overdue | Pending | Feb 06, 2024 |
| 18433953 | AQUEOUS CLEANING LIQUID | PAUL, SHREYA | 1761 | §103 | Non-Final OA | — | Pending | Feb 06, 2024 |
| 18424025 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER | MALLOY, ANNA E | 1737 | §102§103 | Non-Final OA | — | Pending | Jan 26, 2024 |
| 18575649 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | SULLIVAN, CALEEN O | 2899 | §102 | Non-Final OA | — | Pending | Dec 29, 2023 |
| 18260917 | PROTECTIVE FILM FORMING AGENT, AND METHOD OF MANUFACTURING SEMICONDUCTOR CHIP | MALLOY, ANNA E | 1737 | §103 | Non-Final OA | 4d overdue | Pending | Dec 11, 2023 |
| 18568489 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | COSGROVE, JAYSON D | 1737 | §103 | Final Rejection | — | Pending | Dec 08, 2023 |
| 18563358 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | WALKE, AMANDA C | 1722 | §102§103 | Non-Final OA | — | Pending | Nov 21, 2023 |
| 18563359 | RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD | SULLIVAN, CALEEN O | 2899 | §102 | Non-Final OA | — | Pending | Nov 21, 2023 |
| 18512901 | METHOD OF PRODUCING BLOCK COPOLYMER, AND BLOCK COPOLYMER | KAUCHER, MARK S | 1764 | §102 | Non-Final OA | — | Pending | Nov 17, 2023 |
| 18493501 | COMPOSITION AND POLYMER | EASHOO, MARK | 1767 | §102 | Non-Final OA | — | Pending | Oct 24, 2023 |
| 18488113 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | ROSWELL, JESSICA MARIE | 1767 | §103 | Non-Final OA | — | Pending | Oct 17, 2023 |
| 18460104 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | EOFF, ANCA | 1722 | §103§112 | Final Rejection | — | Pending | Sep 01, 2023 |
| 18547637 | PHOTOCURABLE COMPOSITION AND PATTERN-FORMING METHOD | CHAMPION, RICHARD DAVID | 1737 | §103 | Non-Final OA | — | Pending | Aug 23, 2023 |
| 18546814 | PHOTOCURABLE LIQUID COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT | REDDY, KARUNA P | 1764 | §103§112Other | Final Rejection | — | Pending | Aug 17, 2023 |
| 18349825 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | ANGEBRANNDT, MARTIN J | 1737 | §103 | Non-Final OA | — | Pending | Jul 10, 2023 |
| 18339644 | CURABLE COMPOSITION | ROSWELL, JESSICA MARIE | 1767 | §103 | Non-Final OA | 47d | Pending | Jun 22, 2023 |
| 18256899 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | CHU, JOHN S Y | 1737 | §103§112 | Final Rejection | — | Pending | Jun 09, 2023 |
| 18190803 | PHOTORESIST STRIPPER AND METHOD OF TREATING SUBSTRATE USING SAME | TRAYWICK, ANDREW PRESTON | 1737 | §103§112 | Non-Final OA | — | Pending | Mar 27, 2023 |
| 18179942 | RADIATION SHEET, HEAT DISSIPATION PLATE, HEAT DISSIPATION DEVICE AND CURABLE PASTE | FREEMAN, JOHN D | 1787 | §102§103 | Final Rejection | 8d overdue | Pending | Mar 07, 2023 |
| 17996704 | RADIO WAVE ABSORBER AND PASTE FOR FORMING RADIO WAVE ABSORBER | STANLEY, JANE L | 1767 | §103§112 | Final Rejection | 83d | Pending | Oct 20, 2022 |
| 17759396 | RESIST PATTERN FORMATION METHOD | CHU, JOHN S Y | 1737 | §103 | Final Rejection | — | Pending | Jul 25, 2022 |
| 17805188 | CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVICE, METHOD OF PRODUCING SUBSTRATE FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | COSGROVE, JAYSON D | 1737 | §103 | Non-Final OA | 28d | Pending | Jun 02, 2022 |
| 17777382 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | CHAMPION, RICHARD DAVID | 1737 | §103§112 | Non-Final OA | 79d | Pending | May 17, 2022 |
| 17754247 | NEGATIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIST FILM, PATTERN FORMATION METHOD, CURED FILM, CURED FILM PRODUCTION METHOD, AND ROLLED BODY | CHAMPION, RICHARD DAVID | 1737 | §103 | Final Rejection | 42d | Pending | Mar 28, 2022 |
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Start Free TrialTokyo Ohka Kogyo Co., Ltd. has 42 pending office actions as of October 2026, spread across 15 art units and 32 examiners.
Richard David Champion has the most, with 3 of Tokyo Ohka Kogyo Co., Ltd.'s pending office actions.
Mostly Chemistry & Materials (USPTO Tech Center 1700), based on where its pending office actions are examined.
