Prosecution Insights
Last updated: October 26, 2026

Lawrence C Tynes Jr., USPTO Patent Examiner

Listed by the USPTO as TYNES JR., LAWRENCE C

Tech Center 2800 • Art Units: 2816 2822 2899

This examiner grants 86% of resolved cases

Analysis

TYNES JR., LAWRENCE C works in USPTO technology center 2800 and art unit 2816. The profile covers 795 resolved cases, with an 85.5% allowance rate and an 8.8% interview lift. Median time to allowance is 864 days, giving counsel a defined timing reference alongside a high observed allowance rate.

Top company entries include Taiwan Semiconductor Manufacturing Company, Ltd., Samsung Electronics Co., Ltd., and LG Display Co., Ltd. The listed firms are FISH & RICHARDSON P.C. (TC), BIRCH STEWART KOLASCH & BIRCH, LLP, and DENTONS Durham Jones Pinegar. These recurring participants provide useful context for portfolio planning.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

85.5%
Allow Rate
+17.5% vs TC avg
827
Total Applications
+8.8%
Interview Lift
864
Avg Prosecution Days
Based on 795 resolved cases, 2023–2026

Rejection Statute Breakdown

0.6%
§101 Eligibility
27.0%
§102 Novelty
51.6%
§103 Obviousness
17.0%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18736228 SEMICONDUCTOR DEVICE Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18732848 SEMICONDUCTOR MEMORY DEVICE Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18663449 SEMICONDUCTOR DEVICE HAVING SOURCE/DRAIN REGIONS Non-Final OA Samsung Electronics Co., Ltd.
18389134 DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME Non-Final OA LG DISPLAY CO., LTD.
18544881 DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME Non-Final OA Samsung Display Co., LTD.
18715890 SEMICONDUCTOR DEVICE Non-Final OA SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
18410303 SEMICONDUCTOR STRUCTURE HAVING NON-SILICIDE SOURCE/DRAIN CONTACT AND METHOD FOR MANUFACTURING THE SAME Final Rejection TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
18785430 ARCHED MEMBRANE STRUCTURE FOR MEMS DEVICE Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18744471 METHOD AND DEVICE TO INCREASE NANOSHEET DEVICE WIDTH Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.

Facing This Examiner?

IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.

Build Your Strategy

Who Appears Before This Examiner

Top companies before this examiner

Law firms appearing most often

Frequently Asked Questions

What is examiner Lawrence C Tynes Jr.'s allowance rate?

85.5% of resolved applications examined by Lawrence C Tynes Jr. were allowed (795 resolved cases), compared with 65.8% across Art Unit 2816 over the last five years.

Does an interview help with examiner Lawrence C Tynes Jr.?

This examiner's interview lift is +8.8 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Lawrence C Tynes Jr. take to allow a patent?

Applications allowed by Lawrence C Tynes Jr. took 864 days on average from filing to allowance.

Which art unit does examiner Lawrence C Tynes Jr. work in?

Lawrence C Tynes Jr. examines applications in Art Unit 2816 in Tech Center 2800 (Semiconductors, Circuits & Optics).

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month