Listed by the USPTO as VETERE, ROBERT A
Tech Center 2800 • Art Units: 1712 1715 1764 1787 1792 2875
This examiner grants 62% of resolved cases
VETERE, ROBERT A works in tech center 2800 and art unit 1712. The record includes 907 resolved cases, a 61.5% allowance rate, and a median of 1319 days to allowance. The interview lift is 12.8%, showing that interviews have a meaningful recorded relationship with allowance outcomes for this examiner.
The principal company and institutional clients are Samsung Electronics Co., Ltd., The Board of Trustees of the Leland Stanford Junior University, and University of Florida Research Foundation Inc. The leading firms are Lumen Patent Firm, BIRCH STEWART KOLASCH & BIRCH, LLP, and DORITY & MANNING, P.A. Counsel can use these patterns to evaluate likely prosecution posture and interview value in art unit 1712.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19091333 | FILM DEPOSITION METHOD, ELECTRONIC DEVICE FOR PERFORMING METHOD AND FILM DEPOSITION DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18808261 | TRANSPARENT MEMBER AND IMAGE PICKUP APPARATUS, AND METHOD OF MANUFACTURING TRANSPARENT MEMBER | Final Rejection | CANON KABUSHIKI KAISHA |
| 18039875 | METHOD OF TRANSFERRING PARTICLES TO A COATING SURFACE | Non-Final OA | 3M INNOVATIVE PROPERTIES COMPANY |
| 17965029 | APPARATUS AND METHOD FOR MANUFACTURING DISPLAY APPARATUS | Final Rejection | Samsung Display Co., Ltd. |
| 19126288 | HOT END METAL OXIDE COATINGS FOR GLASS SUBSTRATES AND CONTAINERS | Non-Final OA | Arkema Inc. |
| 18490265 | PROTECTIVE COATING FOR ELECTROSTATIC CHUCKS | Final Rejection | Lam Research Corporation |
| 18616193 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF | Final Rejection | TAIZHOU GUANYU TECHNOLOGY CO., LTD. |
| 18706228 | Process for the Pulsed Laser Ejection of Multiple Epitaxial Structures from one Thin Film Growth | Non-Final OA | The Board of Trustees of the Leland Stanford Junior University |
| 18200280 | Fully open-air combustion deposition and rapid plasma treatment of metal oxides | Non-Final OA | The Board of Trustees of the Leland Stanford Junior University |
| 18999454 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18478144 | HIGH-INDEX GLASS | Final Rejection | Schott AG |
| 18331239 | BOROSILICATE GLASS, LAMINATED GLASS, AND WINDOW GLASS FOR VEHICLE | Non-Final OA | AGC Inc. |
| 19033687 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | KOKUSAI ELECTRIC CORPORATION |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy61.5% of resolved applications examined by Robert A Vetere were allowed (907 resolved cases), compared with 43.3% across Art Unit 1712 over the last five years.
This examiner's interview lift is +12.8 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Robert A Vetere took 1,319 days on average from filing to allowance.
Robert A Vetere examines applications in Art Unit 1712 in Tech Center 2800 (Semiconductors, Circuits & Optics).
