Listed by the USPTO as WALJESKI-MOSES, KATRINA MARIE HESTER
Tech Center 4100 • Art Units: 2818 3726 4100
This examiner grants 100% of resolved cases
WALJESKI-MOSES, KATRINA MARIE HESTER is assigned to Tech Center 4100 and Art Unit 2818, with 7 resolved cases. The allowance rate is 100.0%, interview lift is 0.0%, and the median time to allowance is 1028 days. The small number of resolved cases limits the value of these measures as a general predictor.
Samsung Electronics Co., Ltd., Samsung Display Co., Ltd., and KIOXIA Corporation are the leading companies. FOLEY & LARDNER LLP, Westbridge IP LLC, and Bayes PLLC are the leading firms. The available record supports case-specific planning, but does not establish a reliable recurring interview effect.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18409400 | WIPER FOR TRANSFERRING MICRO SEMICONDUCTOR CHIP AND APPARATUS FOR COLLECTING MICRO SEMICONDUCTOR CHIP | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17945534 | LAYER STRUCTURES INCLUDING CARBON-BASED MATERIAL, METHODS OF MANUFACTURING THE LAYER STRUCTURES, ELECTRONIC DEVICES INCLUDING THE LAYER STRUCTURES, AND ELECTRONIC APPARATUSES INCLUDING THE ELECTRONIC DEVICES | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18795635 | DISPLAY DEVICE AND MOBILE ELECTRONIC DEVICE INCLUDING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18596635 | DISPLAY PANEL | Non-Final OA | Samsung Display Co., Ltd. |
| 18799664 | DIELECTRIC STACKS | Non-Final OA | QUALCOMM Incorporated |
| 18217123 | SEMICONDUCTOR LAYER WITH DRY DEPOSITION LAYER | Non-Final OA | Intel Corporation |
| 18603935 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Mitsubishi Electric Corporation |
| 18743825 | SEMICONDUCTOR CIRCUIT, MEMORY SYSTEM, AND INFORMATION PROCESSING DEVICE | Non-Final OA | Kioxia Corporation |
| 18455732 | SEMICONDUCTOR STORAGE DEVICE | Final Rejection | Kioxia Corporation |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy100.0% of resolved applications examined by Katrina Marie Hester Waljeski-Moses were allowed (7 resolved cases), compared with 85.2% across Art Unit 2818 over the last five years.
This examiner's interview lift is +0.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Katrina Marie Hester Waljeski-Moses took 1,028 days on average from filing to allowance.
Katrina Marie Hester Waljeski-Moses examines applications in Art Unit 2818 in Tech Center 4100.
