Prosecution Insights
Prosecution Insights
Tech Center 3600 • Art Units: 2844 2877 2881 3685
This examiner grants 100% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18823846 | FLUID PROCESSING APPARATUS HAVING FLUID BRANCHING AND JOINING MEMBER | Non-Final OA | Stanley Electric Co., Ltd. |
| 18722800 | INSPECTION DEVICE AND FILM QUALITY INSPECTION METHOD | Non-Final OA | Hitachi High-Tech Corporation |
| 18410967 | STERILIZATION APPARATUS | Final Rejection | SL Corporation |
| 18823256 | METASURFACE HOLOGRAPHIC OPTICAL TRAPS FOR ULTRACOLD ATOMS | Non-Final OA | The Trustees of Columbia University in the City of New York |
| 18393267 | PHOTONICALLY INTEGRATED ATOMIC TWEEZER CLOCK | Final Rejection | The Trustees of Columbia University in the City of New York |
| 18791820 | INFORMATION PROCESSING APPARATUS, FREQUENCY ADJUSTMENT METHOD, AND FREQUENCY ADJUSTMENT PROGRAM | Non-Final OA | FUJITSU LIMITED |
| 18794582 | CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION | Non-Final OA | Applied Materials, Inc. |
| 18542905 | Natural Frequency Adjuster For Extraction Electrodes | Non-Final OA | Applied Materials, Inc. |
| 18541196 | ION GENERATOR, MASS SPECTROMETER AND METHOD OF GENERATING IONS | Final Rejection | SHIMADZU CORPORATION |
| 18722784 | SAMPLE SUPPORT BODY AND METHOD FOR MANUFACTURING SAMPLE SUPPORT BODY | Non-Final OA | HAMAMATSU PHOTONICS K.K. |
| 18402641 | DETERMINATION OF LAYER PROPERTIES USING WIDENING OF AN ELECTRON BEAM | Final Rejection | Applied Materials Israel Ltd. |
| 18639028 | MEASUREMENT APPARATUS AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR EUV MICROLITHOGRAPHY | Final Rejection | Carl Zeiss SMT GmbH |
| 18724299 | FLUID TREATMENT DEVICE | Non-Final OA | Ushio Denki Kabushiki Kaisha |
| 18687408 | OPTICAL FILTER AND STERILIZATION DEVICE | Non-Final OA | NIPPON ELECTRIC GLASS CO., LTD. |
| 18674282 | PLATFORM FOR CHARGED PARTICLE APPARATUS AND COMPONENTS WITHIN A CHARGED PARTICLE APPARATUS | Non-Final OA | ASML Netherlands B.V. |
| 18618957 | CHARGED PARTICLE APPARATUS AND METHOD | Final Rejection | ASML Netherlands B.V. |
| 18691828 | SYSTEM AND METHOD FOR INSPECTION BY FAILURE MECHANISM CLASSIFICATION AND IDENTIFICATION IN A CHARGED PARTICLE SYSTEM | Final Rejection | ASML Netherlands B.V. |
| 18402585 | CHARGED PARTICLE-OPTICAL DEVICE, CHARGED PARTICLE APPARATUS AND METHOD | Non-Final OA | ASML Netherlands B.V. |
| 18841615 | SYSTEMS AND METHODS FOR CAPILLARY ISOELECTRIC FOCUSING-MASS SPECTROMETRY (CIEF-MS) ISOELECTRIC POINT (pI) CALIBRATION | Non-Final OA | DH Technologies Development Pte. Ltd. |
| 18837043 | SYSTEMS AND METHODS FOR IMPROVING ANALYSIS OF CHARGE SERIES SPECTRA | Non-Final OA | DH Technologies Development Pte. Ltd. |
| 18696002 | Laser Induced Fragmentation for MRM Analysis | Final Rejection | DH Technologies Development Pte. Ltd. |
| 18617387 | AIRLESS TRANSFER AND ELECTRICAL TESTING OF SOLID STATE BATTERIES IN SCANNING ELECTRON MICROSCOPES | Non-Final OA | FEI Company |
| 18802294 | Method For Producing A Substrate Comprising Scanning Probe Microscopy Tips | Non-Final OA | IMEC VZW |
| 18823820 | MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD | Non-Final OA | NuFlare Technology, Inc. |
| 18799318 | A QUANTUM LOGIC SPECTROSCOPY SYSTEM | Non-Final OA | Oxford Ionics Limited |
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