Listed by the USPTO as ZABEL, ANDREW JOHN
Tech Center 2800 • Art Units: 2818
This examiner grants 82% of resolved cases
ZABEL, ANDREW JOHN is a USPTO patent examiner in tech center 2800 and art unit 2818. The profile reports 40 resolved cases, an 82.5% allowance rate, and a median of 1238 days to allowance. The limited resolved-case volume makes the record narrower than a large examination history, while the allowance figure shows that most recorded cases reached allowance.
The interview lift is 25.9%, indicating a positive association between interviews and allowance outcomes. Taiwan Semiconductor Manufacturing Company, Ltd., Samsung Electronics Co., Ltd., and Kabushiki Kaisha Toshiba are the listed companies. JCIPRNET, Harrity & Harrity , LLP, and OLIFF PLC are the listed firms. Practitioners can use the profile as matter-specific context, while recognizing that the available sample is limited.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18594300 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 18427977 | SEMICONDUCTOR DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 18197847 | DISPLAY MODULE | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18131548 | SEMICONDUCTOR DEVICE | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18185237 | Display with Side-Wrapped Conductive Traces | Final Rejection | Apple Inc. |
| 18767875 | Display Device | Non-Final OA | LG Display Co., Ltd. |
| 18594298 | DISPLAY DEVICE | Final Rejection | Samsung Display Co., LTD. |
| 18682458 | METAL OXIDE THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME, AND DISPLAY PANEL | Non-Final OA | BOE Technology Group Co., Ltd. |
| 18712336 | MAGNETIZATION ROTATION ELEMENT, MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY | Non-Final OA | TDK Corporation |
| 18404657 | LEGGED SUPPORT STRUCTURE TO MITIGATE STACKED DIE OVERHANG DEFLECTION | Final Rejection | Micron Technology, Inc. |
| 18681773 | SEMICONDUCTOR-SUPERCONDUCTOR HYBRID DEVICE HAVING SIDE JUNCTIONS | Non-Final OA | Microsoft Technology Licensing LLC |
| 18044386 | LASER PROCESSING APPARATUS AND LASER PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18434903 | BACKSIDE TO FRONTSIDE CONNECTION BETWEEN DIFFERENT METAL TRACKS | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18683042 | TEMPORARILY BONDED WAFER AND METHOD FOR MANUFACTURING THE WAFER | Non-Final OA | SHIN-ETSU HANDOTAI CO., LTD. |
| 18433936 | BARRIER AND LINER TREATMENT USING DUAL RADIO FREQUENCY CAPACITIVE COUPLE PLASMA FOR METAL INTERCONNECTS | Non-Final OA | Applied Materials, Inc. |
| 18594210 | RESISTOR | Non-Final OA | STMicroelectronics International N.V. |
| 18586596 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING A SEMICONDUCTOR DEVICE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18411620 | Static Random-Access Memory Device with Enhanced Isolation Structure and Increased Packing Density | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18303551 | SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 17887490 | TRANSISTOR, INTEGRATED CIRCUIT, AND MANUFACTURING METHOD OF TRANSISTOR | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18609870 | SEMICONDUCTOR STRUCTURE WITH STRESS RELIEF LAYER AND THE METHODS FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18405526 | FIELD EFFECT TRANSISTOR WITH ISOLATED SOURCE/DRAINS AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18059242 | DISPLAY PANEL AND METHOD OF MANUFACTURING SAME, AND DISPLAY DEVICE | Final Rejection | TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy82.5% of resolved applications examined by Andrew John Zabel were allowed (40 resolved cases), compared with 85.2% across Art Unit 2818 over the last five years.
This examiner's interview lift is +25.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Andrew John Zabel took 1,238 days on average from filing to allowance.
Andrew John Zabel examines applications in Art Unit 2818 in Tech Center 2800 (Semiconductors, Circuits & Optics).
