4 pending office actions • 3 art units • 4 examiners • 0 of 4 (0%) have an AI response strategy ready • 5 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| Multi-statute (no §101) | 4 (100%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| DAGENAIS, KRISTEN A | 1 | 63.6% | +20.2% |
| SWEELY, KURT D | 1 | 52.9% | +35.0% |
| LEE, AIDEN Y | 1 | 47.1% | +26.1% |
| FORD, NATHAN K | 1 | 32.5% | +35.0% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18681894 | AN ATOMIC LAYER DEPOSITION REACTION CHAMBER AND AN ATOMIC LAYER DEPOSITION REACTOR | SWEELY, KURT D | 23d overdue |
| 18248455 | AN ATOMIC LAYER DEPOSITION APPARATUS AND A METHOD | FORD, NATHAN K | 19d overdue |
| 18875858 | A BARRIER DEPOSIT WITHIN A SUBSTRATE | DAGENAIS, KRISTEN A | — |
| 18681930 | AN ATOMIC LAYER DEPOSITION APPARATUS AND AN ARRANGEMENT | LEE, AIDEN Y | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18681894 | AN ATOMIC LAYER DEPOSITION REACTION CHAMBER AND AN ATOMIC LAYER DEPOSITION REACTOR | SWEELY, KURT D | 23d overdue |
| 18248455 | AN ATOMIC LAYER DEPOSITION APPARATUS AND A METHOD | FORD, NATHAN K | 19d overdue |
| 18875858 | A BARRIER DEPOSIT WITHIN A SUBSTRATE | DAGENAIS, KRISTEN A | — |
| 18681930 | AN ATOMIC LAYER DEPOSITION APPARATUS AND AN ARRANGEMENT | LEE, AIDEN Y | — |
| Art Unit | Apps |
|---|---|
| 1717 | 1 |
| 1718 | 1 |
| 1716 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18875858 | A BARRIER DEPOSIT WITHIN A SUBSTRATE | DAGENAIS, KRISTEN A | 1717 | §102§103 | Non-Final OA | — | Pending | Dec 17, 2024 |
| 18681894 | AN ATOMIC LAYER DEPOSITION REACTION CHAMBER AND AN ATOMIC LAYER DEPOSITION REACTOR | SWEELY, KURT D | 1718 | §102§103§112 | Non-Final OA | 23d overdue | Pending | Feb 07, 2024 |
| 18681930 | AN ATOMIC LAYER DEPOSITION APPARATUS AND AN ARRANGEMENT | LEE, AIDEN Y | — | §102§103§112 | Non-Final OA | — | Pending | Feb 07, 2024 |
| 18248455 | AN ATOMIC LAYER DEPOSITION APPARATUS AND A METHOD | FORD, NATHAN K | 1716 | §103§112 | Non-Final OA | 19d overdue | Pending | Apr 10, 2023 |
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