Tech Center 1700 • Art Units: 1713 1718
This examiner grants 46% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19265339 | MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF | Non-Final OA | Samsung Display Co., LTD. |
| 18122451 | DISPLAY APPARATUS AND, APPARATUS AND METHOD OF MANUFACTURING THE SAME | Final Rejection | Samsung Display Co., Ltd. |
| 17335432 | METAL MASK AND DISPLAY APPARATUS MANUFACTURED BY USING THE SAME | Non-Final OA | Samsung Display Co., Ltd. |
| 18023590 | DEPOSITION APPARATUS FOR ORGANIC LIGHT-EMITTING DIODE | Non-Final OA | LG CHEM, LTD. |
| 18486291 | PROCESS CHAMBER GAS FLOW IMPROVEMENT | Non-Final OA | Applied Materials, Inc. |
| 18260841 | MANUFACTURING EQUIPMENT FOR LIGHT-EMITTING DEVICE | Non-Final OA | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 17434701 | CERAMIC STRUCTURE AND SUPPORTING MECHANISM WHICH IS PROVIDED WITH SAID CERAMIC STRUCTURE | Non-Final OA | KYOCERA Corporation |
| 18247489 | VAPORIZER, GAS SUPPLY APPARATUS, AND METHOD OF CONTROLLING GAS SUPPLY APPARATUS | Non-Final OA | Fujikin Incorporated |
| 18472829 | SUBSTRATE TREATING APPARATUS | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 17989089 | MASK FRAME AND EVAPORATION MASK ASSEMBLY | Final Rejection | KunShan Go-Visionox Opto-Electronics Co., Ltd |
| 18475502 | PLASMA PROCESSING APPARATUS AND COIL HOLDER FOR HOLDING PLASMA EXCITATION ANTENNA | Non-Final OA | Tokyo Electron Limited |
| 18369219 | SUBSTRATE PROCESSING METHOD, COMPONENT PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17664607 | Apparatus for Plasma Processing | Non-Final OA | Tokyo Electron Limited |
| 18280374 | PLASMA PROCESSING APPARATUS | Non-Final OA | Hitachi High-Tech Corporation |
| 18475002 | LOADLOCK ASSEMBLY INCLUDING CHILLER UNIT | Non-Final OA | ASM IP Holding, B.V. |
| 18465787 | REACTION CHAMBER COMPONENT, DEPOSITION APPARATUS PROVIDED WITH SUCH COMPONENT AND METHOD OF PROTECTING SUCH COMPONENT | Final Rejection | ASM IP Holding, B.V. |
| 18099338 | GAS SUPPLY ASSEMBLY, SUBSTRATE PROCESSING APPARATUS, NOZZLE, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 18026431 | AXIALLY COOLED METAL SHOWERHEADS FOR HIGH TEMPERATURE PROCESSES | Non-Final OA | LAM RESEARCH CORPORATION |
| 17799866 | HIGH TEMPERATURE SUBSTRATE SUPPORT WITH HEAT SPREADER | Non-Final OA | LAM RESEARCH CORPORATION |
| 18419904 | COATING EQUIPMENT AND COATING METHOD THEREOF | Non-Final OA | IHI Hauzer Techno Coating B.V. |
| 18449541 | TEMPERATURE-CONTROLLED SHOWERHEAD ASSEMBLY FOR CYCLIC VAPOR DEPOSITION | Non-Final OA | Eugenus, Inc. |
| 18095726 | SUBSTRATE HANDLING DEVICE | Non-Final OA | Yield Engineering Systems, Inc. |
| 18468680 | Fixtures for Chemical Vapor Deposition Gradient Coatings | Non-Final OA | HZO, Inc. |
| 18252160 | FILM FORMATION CONTROL DEVICE, FILM FORMATION DEVICE AND FILM FORMATION METHOD | Non-Final OA | Shincron Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy