Technology area: Chemistry & Materials
9 pending office actions • 7 art units • 8 examiners • 0 of 9 (0%) have an AI response strategy ready • 14 patents granted in the last 365 days
Central Glass Company, Limited has 9 pending office actions in Chemistry & Materials. The matters span 8 distinct examiners and 7 distinct art units, reflecting broad distribution across both examiner responsibility and technical assignments.
LU, JIONG-PING is the busiest examiner, with 2 pending matters. The limited concentration under one examiner does not remove the need for broad coordination across the portfolio. Counsel should maintain centralized oversight of claim terminology and disclosure support, while adapting prior-art analysis, amendments, and interview planning to each art unit.
Based on the USPTO statutory response window for each pending office action. 3 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 3 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 3 (33%) |
| Double-patenting + other | 1 (11%) |
| Multi-statute (no §101) | 5 (56%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| LU, JIONG-PING | 2 | 83.6% | +7.9% |
| REMAVEGE, CHRISTOPHER | 1 | 58.5% | +25.8% |
| ABU ALI, SHUANGYI | 1 | 45.4% | +37.7% |
| NGUYEN, KEVIN NMN | 1 | 82.8% | +8.1% |
| WALTERS JR, ROBERT S | 1 | 51.6% | +50.4% |
| HAMMOND, KRISHNA R | 1 | 63.0% | +14.2% |
| MELLOTT, JAMES M | 1 | 51.1% | +44.1% |
| QUIST, NICOLE LEE | 1 | 89.7% | +13.3% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18004992 | LITHIUM IODIDE NONAQUEOUS SOLUTION, LITHIUM IODIDE, NONAQUEOUS SOLVATE OF LITHIUM IODIDE, METHOD FOR PRODUCING LITHIUM IODIDE NONAQUEOUS SOLUTION, METHOD FOR PRODUCING LITHIUM IODIDE, AND METHOD FOR PRODUCING NONAQUEOUS SOLVATE OF LITHIUM IODIDE | QUIST, NICOLE LEE | 28d |
| 18889781 | METHOD AND DEVICE FOR ETCHING SILICON OXIDE | LU, JIONG-PING | — |
| 18699468 | NONAQUEOUS ELECTROLYTE SOLUTION, NONAQUEOUS ELECTROLYTE SOLUTION BATTERY, AND COMPOUND | NGUYEN, KEVIN NMN | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 5 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18273353 | SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER | MELLOTT, JAMES M | 97d overdue |
| 18724487 | COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE | ABU ALI, SHUANGYI | 53d overdue |
| 19027637 | METHOD AND DEVICE FOR ETCHING SILICON OXIDE | LU, JIONG-PING | — |
| 18869223 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | REMAVEGE, CHRISTOPHER | — |
| 18273663 | Nonaqueous Electrolytic Solution, Nonaqueous Electrolytic Solution Battery, and Compound | HAMMOND, KRISHNA R | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 6 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18273353 | SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER | MELLOTT, JAMES M | 97d overdue |
| 18724487 | COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE | ABU ALI, SHUANGYI | 53d overdue |
| 18004992 | LITHIUM IODIDE NONAQUEOUS SOLUTION, LITHIUM IODIDE, NONAQUEOUS SOLVATE OF LITHIUM IODIDE, METHOD FOR PRODUCING LITHIUM IODIDE NONAQUEOUS SOLUTION, METHOD FOR PRODUCING LITHIUM IODIDE, AND METHOD FOR PRODUCING NONAQUEOUS SOLVATE OF LITHIUM IODIDE | QUIST, NICOLE LEE | 28d |
| 18869223 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | REMAVEGE, CHRISTOPHER | — |
| 18583454 | WATER-REPELLENT PROTECTIVE FILM-FORMING AGENT, WATER-REPELLENT PROTECTIVE FILM-FORMING CHEMICAL SOLUTION, AND WAFER SURFACE TREATMENT METHOD | WALTERS JR, ROBERT S | — |
| 18273663 | Nonaqueous Electrolytic Solution, Nonaqueous Electrolytic Solution Battery, and Compound | HAMMOND, KRISHNA R | — |
| Art Unit | Apps |
|---|---|
| 1713 | 3 |
| 1731 | 1 |
| 1752 | 1 |
| 1693 | 1 |
| 1725 | 1 |
| 1759 | 1 |
| 1738 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19027637 | METHOD AND DEVICE FOR ETCHING SILICON OXIDE | LU, JIONG-PING | 1713 | §102§103Other | Non-Final OA | — | Pending | Jan 17, 2025 |
| 18869223 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | REMAVEGE, CHRISTOPHER | 1713 | §102§103 | Non-Final OA | — | Pending | Nov 25, 2024 |
| 18889781 | METHOD AND DEVICE FOR ETCHING SILICON OXIDE | LU, JIONG-PING | 1713 | §102§103DP | Non-Final OA | — | Pending | Sep 19, 2024 |
| 18724487 | COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE | ABU ALI, SHUANGYI | 1731 | §102§103Other | Final Rejection | 53d overdue | Pending | Jun 26, 2024 |
| 18699468 | NONAQUEOUS ELECTROLYTE SOLUTION, NONAQUEOUS ELECTROLYTE SOLUTION BATTERY, AND COMPOUND | NGUYEN, KEVIN NMN | 1752 | §103 | Non-Final OA | — | Pending | Apr 08, 2024 |
| 18583454 | WATER-REPELLENT PROTECTIVE FILM-FORMING AGENT, WATER-REPELLENT PROTECTIVE FILM-FORMING CHEMICAL SOLUTION, AND WAFER SURFACE TREATMENT METHOD | WALTERS JR, ROBERT S | 1693 | §103 | Non-Final OA | — | Pending | Feb 21, 2024 |
| 18273663 | Nonaqueous Electrolytic Solution, Nonaqueous Electrolytic Solution Battery, and Compound | HAMMOND, KRISHNA R | 1725 | §102§103 | Non-Final OA | — | Pending | Jul 21, 2023 |
| 18273353 | SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER | MELLOTT, JAMES M | 1759 | §102§103 | Final Rejection | 97d overdue | Pending | Jul 20, 2023 |
| 18004992 | LITHIUM IODIDE NONAQUEOUS SOLUTION, LITHIUM IODIDE, NONAQUEOUS SOLVATE OF LITHIUM IODIDE, METHOD FOR PRODUCING LITHIUM IODIDE NONAQUEOUS SOLUTION, METHOD FOR PRODUCING LITHIUM IODIDE, AND METHOD FOR PRODUCING NONAQUEOUS SOLVATE OF LITHIUM IODIDE | QUIST, NICOLE LEE | 1738 | §103 | Final Rejection | 28d | Pending | Jan 10, 2023 |
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Start Free TrialCentral Glass Company, Limited has 9 pending office actions as of October 2026, spread across 7 art units and 8 examiners.
Jiong-Ping Lu has the most, with 2 of Central Glass Company, Limited's pending office actions.
Mostly Chemistry & Materials (USPTO Tech Center 1700), based on where its pending office actions are examined.
