Listed by the USPTO as WALTERS JR, ROBERT S
Tech Center 3700 • Art Units: 1693 1711 1715 1717 1737 1759 1784 1787 1788 1792
This examiner grants 52% of resolved cases
WALTERS JR, ROBERT S examines applications in Tech Center 3700 and Art Unit 1693. His record covers 1115 resolved cases, with a 51.6% allowance rate and a median of 1287 days to allowance. The allowance rate is close to an even division of resolved matters, while the median timing indicates a prosecution path that commonly extends beyond three years.
The 50.4% interview lift is a strong positive association between interviews and allowance in this record. The leading companies are Applied Materials Inc., Fujifilm Corporation, and ASM IP Holding B.V. The leading firms are JCIPRNET, Sherwin-Williams-Tucker Ellis LLP, and KENJA IP LAW PC. Interview preparation should be a central part of prosecution planning, especially when applicants need to distinguish claims without excessive narrowing.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19226533 | METHOD OF MANUFACTURING GAS BARRIER FILM | Non-Final OA | FUJIFILM Corporation |
| 18644077 | MANUFACTURING METHOD OF ELECTRONIC DEVICE | Final Rejection | FUJIFILM Corporation |
| 18545064 | Molding Material | Final Rejection | SEIKO EPSON CORPORATION |
| 19199769 | Methods for Depositing Gap-Filling Fluids and Related Systems and Devices | Final Rejection | ASM IP Holding B.V. |
| 18754246 | METHODS AND ASSEMBLIES FOR DEPOSITING MATERIAL IN A GAP | Non-Final OA | ASM IP Holding B.V. |
| 18698276 | SELECTIVE CONTROL OF MULTI-STATION PROCESSING CHAMBER COMPONENTS | Non-Final OA | Lam Research Corporation |
| 18559811 | COMPOSITIONS, COMPRISING PLATELET-SHAPED TRANSITION METAL PARTICLES | Non-Final OA | BASF SE |
| 18262211 | TWO-COMPONENT SYSTEM FOR PREPARING DEODORANT POLYURETHANE FOAMS | Non-Final OA | BASF SE |
| 18848912 | METHOD FOR MANUFACTURING HOT-DIP GALVANIZED STEEL SHEET, AND EQUIPMENT FOR MANUFACTURING HOT-DIP GALVANIZED STEEL SHEET | Final Rejection | JFE STEEL CORPORATION |
| 19184288 | FILM FORMING METHOD AND FILM FORMING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18360255 | METHOD AND SYSTEM FOR ELECTROSTATICALLY CHARGING STAMPING LUBRICANT TO CONTROL DEPOSITION | Non-Final OA | Ford Global Technologies, LLC |
| 19226344 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | Final Rejection | SK Hynix Inc. |
| 18276914 | METHOD FOR MANUFACTURING SURFACE-TREATED GAS-PHASE-PROCESS SILICA PARTICLE, SURFACE-TREATED GAS-PHASE-PROCESS SILICA PARTICLE, AND TONER EXTERNAL ADDITIVE FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT | Final Rejection | SHIN-ETSU CHEMICAL CO., LTD. |
| 18656477 | SUBSTRATE COATING COMPOSITIONS AND METHODS | Final Rejection | HONEYWELL INTERNATIONAL INC. |
| 19173421 | PRECURSOR, GAS MIXTURE, AND METHOD FOR DEPOSITING A LOW K DIELECTRIC FILM | Final Rejection | Applied Materials, Inc. |
| 18384688 | METHOD OF BLOCKING DIELECTRIC SURFACES USING BLOCKING MOLECULES TO ENABLE SELECTIVE EPI DEPOSITION | Final Rejection | Applied Materials, Inc. |
| 17081773 | SURFACE ENCASING MATERIAL LAYER | Final Rejection | Applied Materials, Inc. |
| 18038100 | Starch as a Primer for Substrates | Non-Final OA | Knauf Gips KG |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy51.6% of resolved applications examined by Robert S Walters Jr. were allowed (1,115 resolved cases), compared with 59.4% across Art Unit 1693 over the last five years.
This examiner's interview lift is +50.4 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Robert S Walters Jr. took 1,287 days on average from filing to allowance.
Robert S Walters Jr. examines applications in Art Unit 1693 in Tech Center 3700 (Medical Devices & Mechanical Engineering).
