Prosecution Insights
Last updated: October 02, 2026

Examiner: LEE, WILSON

Tech Center 2800 • Art Units: 2152 2155 2163 2844 2845

This examiner grants 87% of resolved cases

Analysis

Wilson Lee is an examiner in Tech Center 2800 and Art Unit 2152. With 663 resolved cases, the allowance rate is a high 86.7 percent. The interview lift is 3.3 percent, which is a small but positive increase in the likelihood of allowance.

The median days to allowance is 1010. This timeline is based on the 663 resolved cases. The 86.7 percent allowance rate suggests a high probability of success for applicants. The 3.3 percent interview lift indicates that interviews are a helpful, though not strictly necessary, part of the process.

Practitioners should expect a 1010-day median timeline for allowance. The allowance rate is a strong indicator of a favorable prosecution environment in Art Unit 2152. The interview lift across resolved cases shows that direct communication can still provide a benefit. This data set provides a clear expectation for successful outcomes.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

86.7%
Allow Rate
+18.7% vs TC avg
685
Total Applications
+3.3%
Interview Lift
1010
Avg Prosecution Days
Based on 664 resolved cases, 2023–2026

Rejection Statute Breakdown

22.0%
§101 Eligibility
22.4%
§102 Novelty
31.6%
§103 Obviousness
12.9%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
19228953 PHASE SHIFT CIRCUIT, ANTENNA SYSTEM, AND COMMUNICATION DEVICE Non-Final OA HUAWEI TECHNOLOGIES CO., LTD.
18960469 ANTENNA, COMMUNICATION DEVICE, AND COMMUNICATION SYSTEM Non-Final OA HUAWEI TECHNOLOGIES CO., LTD.
18505340 STRATIFIED ANTENNA FOR WRIST-WEARABLE DEVICES Final Rejection Meta Platforms Technologies, LLC
18948444 DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE Non-Final OA Lam Research Corporation
18234169 METHOD AND SYSTEM FOR MONITORING RADICAL SPECIES FLUX OF PLASMA Non-Final OA APPLIED MATERIALS, INC.
18138629 UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE Final Rejection Applied Materials, Inc.
19021284 CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, INFORMATION PROCESSING METHOD, PLASMA PROCESSING DEVICE, AND INFORMATION PROCESSING DEVICE Non-Final OA Tokyo Electron Limited
19189949 METHOD AND SYSTEM FOR MITIGATING INTERFERENCE BY DISPLACING ANTENNA STRUCTURES Non-Final OA ISCO International, LLC
19014898 ANTENNA STRUCTURE Final Rejection Wistron NeWeb Corporation
18791590 ELECTRONIC DEVICE AND ANTENNA MODULE Final Rejection WISTRON NEWEB CORPORATION
18262305 SINUSOIDAL LAMP DRIVER Non-Final OA trinamiX GMBH
19023737 SYSTEMS, APPARATUSES, AND METHODS OF MANUFACTURING LINEAR ACCELERATORS Final Rejection Varian Medical Systems, Inc.
18985805 SYSTEM, METHOD AND APPARATUS FOR HIGH-SPEED WIRELESS COMMUNICATION THROUGH HIGH-LOSS OBSTRUCTION Non-Final OA Airvine Scientific, Inc.

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