Prosecution Insights
Prosecution Insights
Technology area: Chemistry & Materials
6 pending office actions • 4 art units • 6 examiners • 0 of 6 (0%) have an AI response strategy ready • 6 patents granted in the last 365 days
SHIBAURA MECHATRONICS Corporation is navigating 5 pending office actions within the Chemistry & Materials technology area. These actions are spread across 3 distinct art units, reflecting a diverse range of technical subject matter within the portfolio. The involvement of 5 distinct examiners means that every pending action is assigned to a unique official. This variety among the 5 distinct examiners suggests that the company must adapt to multiple examination styles simultaneously within the Chemistry & Materials sector.
CAMPBELL, NATASHA N. is the busiest examiner, holding 1 pending office action. With 5 distinct examiners managing the 5 pending office actions, the company faces a broad range of feedback. The presence of 3 distinct art units further suggests that the prosecution strategy must account for different internal policies. Because the workload is distributed, no examiner handles a majority of the cases across the art units involved in the current portfolio.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 2 (33%) |
| Double-patenting + other | 1 (17%) |
| Multi-statute (no §101) | 3 (50%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| CAMPBELL, NATASHA N. | 1 | 67.8% | +14.4% |
| LEE, DOUGLAS | 1 | 45.3% | +13.7% |
| CHAUDHRI, OMAIR | 1 | 65.9% | +22.7% |
| PARSLEY, DAVID J | 1 | 54.0% | +28.7% |
| MCDONALD, RODNEY GLENN | 1 | 63.6% | +24.4% |
| KURPLE, KARL | 1 | 51.9% | +63.6% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18897666 | CLEANING APPARATUS FOR WAFER STORAGE CONTAINER | CHAUDHRI, OMAIR | — |
| 18891253 | SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD | PARSLEY, DAVID J | — |
| 18612678 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | MCDONALD, RODNEY GLENN | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 6 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19188406 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | CAMPBELL, NATASHA N. | — |
| 19087923 | SUBSTRATE TREATMENT DEVICE | LEE, DOUGLAS | — |
| 18897666 | CLEANING APPARATUS FOR WAFER STORAGE CONTAINER | CHAUDHRI, OMAIR | — |
| 18891253 | SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD | PARSLEY, DAVID J | — |
| 18612678 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | MCDONALD, RODNEY GLENN | — |
| 18103462 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | KURPLE, KARL | — |
| Art Unit | Apps |
|---|---|
| 1714 | 1 |
| 1711 | 1 |
| 1713 | 1 |
| 1717 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19188406 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | CAMPBELL, NATASHA N. | — | §103 | Non-Final OA | — | Pending | Apr 24, 2025 |
| 19087923 | SUBSTRATE TREATMENT DEVICE | LEE, DOUGLAS | 1714 | §102§103DP | Final Rejection | — | Pending | Mar 24, 2025 |
| 18897666 | CLEANING APPARATUS FOR WAFER STORAGE CONTAINER | CHAUDHRI, OMAIR | 1711 | §103§112 | Non-Final OA | — | Pending | Sep 26, 2024 |
| 18891253 | SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD | PARSLEY, DAVID J | — | §103§112 | Non-Final OA | — | Pending | Sep 20, 2024 |
| 18612678 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | MCDONALD, RODNEY GLENN | 1713 | §102§103 | Non-Final OA | — | Pending | Mar 21, 2024 |
| 18103462 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | KURPLE, KARL | 1717 | §103 | Final Rejection | — | Pending | Jan 30, 2023 |
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