Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1724 1756 1794 1795
This examiner grants 63% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18469590 | APPARATUS AND METHOD OF MANUFACTURING DISPLAY DEVICE | Non-Final OA | Samsung Display Co., Ltd. |
| 18959678 | FILM FORMING APPARATUS | Non-Final OA | SUMITOMO HEAVY INDUSTRIES, LTD. |
| 18971510 | MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION | Non-Final OA | Applied Materials, Inc. |
| 18391176 | ELECTRODE CONFIGURATIONS AND MAGNET CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATED METHODS AND APPARATUS, FOR SEMICONDUCTOR MANUFACTURING | Final Rejection | Applied Materials, Inc. |
| 18144747 | HIGH EFFICIENCY MICROWAVE PLASMA APPLICATOR | Non-Final OA | Applied Materials, Inc, |
| 18108432 | TRANSFER APPARATUS, AND RELATED COMPONENTS AND METHODS, FOR TRANSFERRING SUBSTRATES | Non-Final OA | Applied Materials, Inc. |
| 18099277 | COMPOSITE PVD TARGETS | Final Rejection | Applied Materials, Inc. |
| 18327590 | PLASMA PROCESSING APPARATUS AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 19033192 | METHOD AND APPARATUS FOR METAL AND CERAMIC NANOLAYERING FOR ACCIDENT TOLERANT NUCLEAR FUEL, PARTICLE ACCELERATORS, AND AEROSPACE LEADING EDGES | Non-Final OA | Starfire Industries LLC |
| 19017900 | HIGH PURITY SULFUR-DOPED COPPER SPUTTERING TARGET ASSEMBLY AND METHOD FOR PRODUCING SAME | Non-Final OA | TOSOH SMD, INC. |
| 18992526 | Co-Cr-Pt-OXIDE-BASED SPUTTERING TARGET | Non-Final OA | TANAKA PRECIOUS METAL TECHNOLOGIES, LTD. |
| 18872170 | METHOD FOR CONTROLLING SPECIFIC RESISTIVITY AND STRESS OF TUNGSTEN THROUGH PVD SPUTTERING METHOD | Non-Final OA | ULVAC, INC. |
| 18492149 | SUBSTRATE TREATMENT APPARATUS USING SUPERCRITICAL FLUID | Non-Final OA | SEMES CO., LTD. |
| 18871809 | GALLIUM NITRIDE SINTERED BODY AND METHOD FOR PRODUCING THE SAME | Non-Final OA | TOSOH CORPORATION |
| 18866558 | METALLIC SPUTTERING TARGET, PRODUCTION METHOD THEREFOR, AND METALLIC MATERIAL AND PRODUCTION METHOD THEREFOR | Non-Final OA | TOSOH CORPORATION |
| 18247724 | SPARK PLASMA SINTERED COMPONENT FOR PLASMA PROCESSING CHAMBER | Non-Final OA | Lam Research Corporation |
| 18393836 | SYSTEMS AND METHODS FOR UNIFORM COATING OF ROLLING SPHERES | Non-Final OA | Lawrence Livermore National Security, LLC |
| 17776806 | METHOD OF DEPOSITING MATERIAL ON A SUBSTRATE | Non-Final OA | Dyson Technology Limited |
| 18679972 | Perpendicular MR SAF | Non-Final OA | Allegro MicroSystems, LLC |
| 18724150 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD | Final Rejection | PSK INC. |
| 17182874 | APPROACHES TO MODIFYING A COLOR OF AN ELECTROCHROMIC STACK IN A TINTED STATE | Non-Final OA | SAGE Electrochromics, Inc. |
| 18392422 | HIGHLY HOMOGENEOUS GLASS SPUTTER TARGETS WITH LARGE ASPECT RATIO AND HIGH RELATIVE DENSITY FOR PHYSICAL VAPOR DEPOSITION | Final Rejection | SCHOTT Japan Corporation |
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