Prosecution Insights
Last updated: October 02, 2026

Examiner: LEE, DOUGLAS

Tech Center 1700 • Art Units: 1711 1714 1718

This examiner grants 45% of resolved cases

Analysis

Examiner DOUGLAS LEE works in Tech Center 1700 and Art Unit 1711. The examiner has concluded 675 resolved cases. The allowance rate for these cases is 45.3 percent. This percentage reflects the frequency at which the examiner grants a patent relative to the total number of applications that reach a final resolution. The 45.3 percent rate serves as a primary indicator for applicants navigating this specific art unit.

The median days to allowance is 1297. This value represents the middle point of the time distribution for applications that result in a patent grant. A median of 1297 days offers a specific timeline for practitioners to consider when managing client expectations. Understanding this duration is essential for procedural planning in Tech Center 1700 and Art Unit 1711.

An interview lift of 13.7 percent is recorded for this profile. This metric shows the change in the probability of allowance when an interview is conducted during the prosecution process. A lift of 13.7 percent suggests that direct engagement with the examiner may influence the final outcome. For the 675 resolved cases, these figures define the current prosecution landscape for this examiner.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

45.3%
Allow Rate
-19.7% vs TC avg
710
Total Applications
+13.7%
Interview Lift
1297
Avg Prosecution Days
Based on 675 resolved cases, 2023–2026

Rejection Statute Breakdown

0.8%
§101 Eligibility
10.1%
§102 Novelty
63.5%
§103 Obviousness
23.1%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18888814 ELECTRONIC APPARATUS FOR ADAPTIVELY CHANGING CLEANING PATH BASED ON DUST DISTRIBUTION AND CONTROL METHOD THEREOF Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18356486 COMPOSITIONS AND METHODS OF USE THEREOF Non-Final OA FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
18455976 CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE Final Rejection CANON KABUSHIKI KAISHA
19173239 DE-POWDERING OF ADDITIVE MANUFACTURING BUILD Non-Final OA General Electric Company
18435396 CHARGING AND CLEANING SYSTEM FOR AN ELECTRIC VEHICLE Final Rejection AUDI AG
18615395 LASER SURFACE MODIFICATION METHOD AND SYSTEM FOR IMPROVED PLATE SURFACE Non-Final OA Rockwell Collins, Inc
19181663 Container Comprising a Connection Piece Having a Finger Ring Non-Final OA Henkel AG & Co. KGaA
19182206 Container With a Connection Piece Which Has a Membrane Non-Final OA Henkel AG & Co. KGaA
18972360 LOW TOXICITY SURFACTANT BOOSTER COMPOSITIONS FOR FILTRATION MEMBRANE CLEANING APPLICATIONS Non-Final OA ECOLAB USA INC.
18526000 ENVIRONMENT SCRUBBING VIA SWARM DEVICES Final Rejection INTERNATIONAL BUSINESS MACHINES CORPORATION
18726779 ZONE CLEANING CONTROL METHOD AND APPARATUS FOR CLEANING ROBOT, AND ELECTRONIC DEVICE Non-Final OA Beijing Roborock Technology Co., Ltd.
18883420 METHOD AND ARRANGEMENT FOR PRE-CLEANING AN ENDOSCOPE Final Rejection Olympus Winter & Ibe GmbH
18442234 METHODS AND APPARATUS FOR PRECLEANING AND TREATING WAFER SURFACES Non-Final OA Applied Materials, Inc.
18879383 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND STORAGE MEDIUM Non-Final OA Tokyo Electron Limited
18949248 SUBSTRATE STANDBY DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD Final Rejection Tokyo Electron Limited
18971492 METHOD FOR PROCESSING SUBSTRATE, KIT FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE Non-Final OA TOKYO OHKA KOGYO CO., LTD.
19087923 SUBSTRATE TREATMENT DEVICE Final Rejection SHIBAURA MECHATRONICS CORPORATION
18845803 CHARGING AND DISCHARGING METHOD FOR CLEANING DEVICE, AND CLEANING SYSTEM Non-Final OA TINECO INTELLIGENT TECHNOLOGY CO., LTD.

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