Prosecution Insights
Prosecution Insights
5 pending office actions • 3 art units • 5 examiners • 0 of 5 (0%) have an AI response strategy ready • 22 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 5 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 5 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 5 (100%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| MULVANEY, ELIZABETH EVANS | 1 | 78.6% | +15.3% |
| CARRILLO, BIBI SHARIDAN | 1 | 62.2% | -17.0% |
| BRATLAND JR, KENNETH A | 1 | 56.3% | +16.3% |
| SONG, MATTHEW J | 1 | 60.4% | +14.0% |
| QI, HUA | 1 | 55.4% | +23.7% |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18294193 | DEVICE AND METHOD FOR PRODUCING A MONOCRYSTALLINE SILICON ROD | SONG, MATTHEW J | 46d overdue |
| 18554477 | PROCESS FOR MANUFACTURING SEMICONDUCTOR WAFERS CONTAINING A GAS-PHASE EPITAXIAL LAYER IN A DEPOSITION CHAMBER | QI, HUA | 2d overdue |
| 18683789 | METHOD OF PRODUCING AN EPITAXIALLY COATED SEMICONDUCTOR WAFER OF MONOCRYSTALLINE SILICON | BRATLAND JR, KENNETH A | 8d |
| 19114474 | PROCESS FOR MANUFACTURING A SILICON SINGLE CRYSTAL, AND SEMICONDUCTOR WAFER MADE OF SINGLE-CRYSTAL SILICON | MULVANEY, ELIZABETH EVANS | 30d |
| Art Unit | Apps |
|---|---|
| 1714 | 3 |
| 1785 | 1 |
| 1711 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19114474 | PROCESS FOR MANUFACTURING A SILICON SINGLE CRYSTAL, AND SEMICONDUCTOR WAFER MADE OF SINGLE-CRYSTAL SILICON | MULVANEY, ELIZABETH EVANS | 1785 | §103 | Non-Final OA | 30d | Pending | Mar 24, 2025 |
| 18848950 | METHOD FOR CLEANING SEMICONDUCTOR WAFERS IN A CLEANING LINE | CARRILLO, BIBI SHARIDAN | 1711 | §103 | Non-Final OA | 7d | Pending | Sep 20, 2024 |
| 18683789 | METHOD OF PRODUCING AN EPITAXIALLY COATED SEMICONDUCTOR WAFER OF MONOCRYSTALLINE SILICON | BRATLAND JR, KENNETH A | 1714 | §103 | Non-Final OA | 8d | Pending | Feb 15, 2024 |
| 18294193 | DEVICE AND METHOD FOR PRODUCING A MONOCRYSTALLINE SILICON ROD | SONG, MATTHEW J | 1714 | §103 | Non-Final OA | 46d overdue | Pending | Feb 01, 2024 |
| 18554477 | PROCESS FOR MANUFACTURING SEMICONDUCTOR WAFERS CONTAINING A GAS-PHASE EPITAXIAL LAYER IN A DEPOSITION CHAMBER | QI, HUA | 1714 | §103 | Non-Final OA | 2d overdue | Pending | Oct 09, 2023 |
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