Prosecution Insights
Last updated: October 01, 2026

Sumitomo Heavy Industries Material Solutions Co. Ltd.

Technology area: Semiconductors, Circuits & Optics

3 pending office actions • 1 art units • 3 examiners • 0 of 3 (0%) have an AI response strategy ready

Analysis

Sumitomo Heavy Industries Material Solutions Co. Ltd. has 3 pending office actions in the Semiconductors, Circuits & Optics technology area. These actions are assigned to 3 distinct examiners, ensuring that each pending matter is handled by a unique individual. All 3 actions are concentrated within 1 distinct art unit, showing a unified technical classification for the portfolio.

WANG, JING is the busiest examiner for the company, currently overseeing 1 pending office action. With 3 distinct examiners for the 3 pending actions, the workload is evenly split. The concentration of multiple examiners in 1 art unit suggests that the company's semiconductor materials applications are being reviewed by several different people within the same specialized office. This allows the company to benefit from different examiner perspectives while maintaining a consistent focus within a single technical group. Practitioners should monitor the feedback from all three examiners to identify any common themes or requirements within this specific art unit.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Portfolio Summary

3
Total Pending OAs
2
Non-Final OAs
1
Final Rejections
0
Advisory / Quayle

Response Deadline Pressure

Based on the USPTO statutory response window for each pending office action. 1 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.

0
Overdue
0
Due this week
0
Due this month
1
Due in next 60 days
0
Due later

Case Difficulty Mix

Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.

2
Hard (67%)
1
Medium (33%)
0
Easy (0%)
0
Unknown (0%)

Rejection Statute Mix

BucketCases
§101 + other1 (33%)
§103 only1 (33%)
Multi-statute (no §101)1 (33%)

Industry Mix

How the docket's pending cases split across USPTO tech-center bands.

0
Life Sciences
0% of docket
0
Information Tech
0% of docket
0
Communications
0% of docket
1
Semiconductors
33% of docket
0
Mechanical / Eng
0% of docket
2
Business / Other
67% of docket

Time-on-OA Estimate

Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.

30 h
Manual time on pending OAs
6 h
Time saved (low, 20%)
10 h
Time saved (mid, 35%)
0.3 wks
FTE-weeks freed (mid)

Top Examiners on this docket

ExaminerApps on this docketAllow rateInterview lift
WANG, JING 1 100.0% +0.0%
CHEN, KEATH T 1 30.2% +24.7%
LOGIE, MICHAEL J 1 63.4% +9.3%

Hard Cases (2)

Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 2 ordered by deadline are shown.

App #TitleExaminerDue in
18108429 ION IMPLANTER AND ION IMPLANTATION METHOD LOGIE, MICHAEL J 34d
18890874 METHOD FOR MONITORING NEUTRON RAY AND ION IMPLANTER WANG, JING —

Interview Candidates (1)

Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 1 ordered by deadline are shown.

App #TitleExaminerDue in
18820393 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE CHEN, KEATH T —

Top Art Units

Art UnitApps
2881 1

Pending Office Actions

App #TitleExaminerArt UnitStatutesStatusDue inAIFiled
18890874 METHOD FOR MONITORING NEUTRON RAY AND ION IMPLANTER WANG, JING — §101§102§103 Non-Final OA — Pending Sep 20, 2024
18820393 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE CHEN, KEATH T — §103 Non-Final OA — Pending Aug 30, 2024
18108429 ION IMPLANTER AND ION IMPLANTATION METHOD LOGIE, MICHAEL J 2881 §102§103 Final Rejection 34d Pending Feb 10, 2023

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