Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1712 1716 1792
This examiner grants 30% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18442808 | LOCAL PART MASKING FOR IMPROVED UNIFORMITY IN CERAMIC MATRIX COMPOSITES | Non-Final OA | RTX Corporation |
| 18476808 | NOVEL COATING METHOD OF COMPLEX 3D STRUCTURES USING LOW PRESSURE CHEMICAL VAPOR DEPOSITION | Non-Final OA | California Institute of Technology |
| 18644599 | ELECTROSTATIC CHUCK, ETCHING APPARATUS, AND METHOD OF MANUFACTURING DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18449822 | MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF | Non-Final OA | Samsung Display Co., Ltd. |
| 18296490 | APPARATUS AND METHOD FOR MANUFACTURING DISPLAY DEVICE | Non-Final OA | Samsung Display Co., Ltd. |
| 18048686 | MASK ASSEMBLY AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | SAMSUNG DISPLAY CO., LTD. |
| 18523394 | SINGLE WAFER PROCESSING ENVIRONMENTS WITH SPATIAL SEPARATION | Final Rejection | Applied Materials, Inc. |
| 18198123 | SENSOR FOR MEASUREMENT OF RADICALS | Non-Final OA | Applied Materials, Inc. |
| 18094765 | CHAMBERS, METHODS, AND APPARATUS FOR GENERATING ATOMIC RADICALS USING UV LIGHT | Non-Final OA | Applied Materials, Inc. |
| 17693037 | SEMICONDUCTOR CHAMBER COMPONENTS WITH MULTI-LAYER COATING | Non-Final OA | Applied Materials, Inc. |
| 17046975 | EVAPORATION SOURCE FOR DEPOSITION OF EVAPORATED MATERIAL ON A SUBSTRATE, DEPOSITION APPARATUS, METHOD FOR MEASURING A VAPOR PRESSURE OF EVAPORATED MATERIAL, AND METHOD FOR DETERMINING AN EVAPORATION RATE OF AN EVAPORATED MATERIAL | Non-Final OA | Applied Materials, Inc. |
| 18159310 | METHOD FOR INSPECTING MASK, METHOD FOR MANUFACTURING MASK, APPARATUS FOR INSPECTING MASK, STORAGE MEDIUM, AND MASK | Non-Final OA | Dai Nippon Printing Co., Ltd. |
| 18135937 | MASK-SUPPORT ASSEMBLY AND PRODUCING METHOD THEREOF | Final Rejection | Olum Material Corporation |
| 18456614 | PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | Non-Final OA | Kioxia Corporation |
| 17815318 | PLASMA ETCHER EDGE RING WITH A CHAMFER GEOMETRY AND IMPEDANCE DESIGN | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18353747 | PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD | Non-Final OA | TOKYO ELECTRON LIMITED |
| 18205426 | PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, PRESSURE VALVE CONTROL DEVICE, PRESSURE VALVE CONTROL METHOD, AND PRESSURE REGULATION SYSTEM | Final Rejection | Tokyo Electron Limited |
| 17859520 | PLASMA PROCESSING APPARATUS AND PROCESSING METHOD | Non-Final OA | TOKYO ELECTRON LIMITED |
| 17645829 | PROCESS MODULE, SUBSTRATE PROCESSING SYSTEM, AND PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 19063918 | LOW-TEMPERATURE VAPORIZER FOR ION IMPLANTER WITH IN-VACUUM CONTROLLED FLOW | Final Rejection | Axcelis Technologies, Inc. |
| 18014659 | COATING DEVICE FOR DEPOSITING A COATING MATERIAL ON A SUBSTRATE | Non-Final OA | ThyssenKrupp Steel Europe AG |
| 18465537 | GAS SUPPLIER PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Kokusai Electric Corporation |
| 17476843 | VAPORIZING SYSTEM, SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | KOKUSAI ELECTRIC CORPORATION |
| 18148078 | LIFT PIN UNIT AND UNIT FOR SUPPORTING SUBSTRATE AND SUBSTRATE TREATING APPARATUS | Non-Final OA | SEMES CO., LTD. |
| 18146693 | APPARATUS AND METHOD FOR TREATING SUBSTRATE | Non-Final OA | SEMES CO., LTD. |
| 18125137 | METAL MASK | Final Rejection | DARWIN PRECISIONS CORPORATION |
| 18035200 | PEDESTAL INCLUDING SEAL | Non-Final OA | LAM RESEARCH CORPORATION |
| 18250349 | LOCALIZED PLASMA ARC PREVENTION VIA PURGE RING | Final Rejection | Lam Research Corporation |
| 17785862 | METHOD AND APPARATUS FOR USE IN GENERATING PLASMA | Non-Final OA | Dyson Technology Limited |
| 17638796 | THERMAL EVAPORATION PLASMA DEPOSITION | Non-Final OA | Dyson Technology Limited |
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