Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2877 2878 2882 2884 2886
This examiner grants 77% of resolved cases
Isiaka O Akanbi is an examiner in Tech Center 2800, specifically in Art Unit 2877. The examiner has a volume of 1100 resolved cases. The allowance rate for these cases is 76.6 percent. This rate indicates a positive outcome for a majority of the applications reviewed by this examiner.
The interview lift is 22.8 percent. This is an increase, suggesting that direct communication with the examiner is an effective strategy. Practitioners should prioritize interviews, as the 22.8 percent lift indicates a positive impact on the chances of allowance in Art Unit 2877.
The median days to allowance is 909. This duration provides a baseline for the expected length of the prosecution process. With 1100 resolved cases, the examiner has an extensive history in Tech Center 2800. The 76.6 percent allowance rate and 909 day median are key metrics for practitioners to use when planning their approach.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18924455 | DEFECT INSPECTION SYSTEM AND DEFECT INSPECTION METHOD | Final Rejection | Samsung Electronics Co., Ltd. |
| 18976737 | OPTICAL FIBER MONITORING SYSTEM, REMOTE MONITORING DEVICE, AND OPTICAL FIBER MONITORING METHOD | Final Rejection | NEC Corporation |
| 18934246 | DISPLAY DEVICE | Final Rejection | Samsung Display Co., Ltd. |
| 19457731 | INFRARED ABSORBANCE-MODULATED EVANESCENT SCATTERING MICROSCOPY | Non-Final OA | Trustees of Boston University |
| 18755217 | REPAIR DIAGRAM GENERATION DEVICE, REPAIR DIAGRAM GENERATION METHOD, AND PROGRAM | Non-Final OA | FUJIFILM Corporation |
| 18839307 | FLUID ANALYSIS SYSTEM AND METHODS | Final Rejection | The Johns Hopkins University |
| 18578067 | OBJECTIVE LENS AND SAMPLE ANALYZER | Non-Final OA | Sony Group Corporation |
| 18873008 | COMPARATOR, LIGHT DETECTION ELEMENT, AND ELECTRONIC DEVICE | Final Rejection | Sony Semiconductor Solutions Corporation |
| 18711236 | DEPTH SENSOR DEVICE AND METHOD FOR OPERATING A DEPTH SENSOR DEVICE | Non-Final OA | Sony Semiconductor Solutions Corporation |
| 19190996 | INSPECTION DEVICES AND INSPECTION METHODS | Non-Final OA | TOPPAN HOLDINGS INC. |
| 18939263 | FLOW CYTOMETER | Final Rejection | Beckman Coulter, Inc. |
| 18414622 | APPARATUSES AND METHODS FOR ASSESSING DEEP ULTRAVIOLET REFLECTIVITY OF A PELLICLE FOR AN EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY MASK | Non-Final OA | Taiwan Semiconductor Manufacturing Company, LTD. |
| 19090475 | SUBSTRATE EVALUATION METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 19195680 | Surface Plasmon Resonance Signal Amplification | Non-Final OA | Nicoya Lifesciences Inc. |
| 19186153 | METHOD OF PRODUCING REFERENCE-SPECTRUM LIBRARY FOR USE IN ESTIMATION OF FILM THICKNESS OF WORKPIECE | Non-Final OA | EBARA CORPORATION |
| 18856459 | A LITHOGRAPHIC APPARATUS, AN INSPECTION SYSTEM, AND A DETECTOR HAVING A SQUARE-CORE FIBER | Final Rejection | ASML Netherlands B.V. |
| 19107911 | INSPECTION SYSTEM AND METHOD FOR A CLOSED MEDICAL CONTAINER | Non-Final OA | HOFFMANN-LA ROCHE INC. |
| 18282759 | CHROMATIC CONFOCAL MEASURING SYSTEM FOR HIGH-SPEED DISTANCE MEASUREMENT | Final Rejection | PRECITEC OPTRONIK GMBH |
| 18414488 | TEST METHOD FOR A WAFER AND WAFER | Final Rejection | United Microelectronics Corp. |
| 18851112 | MONITORING SYSTEM BASED ON MULTIPLEXED MULTIMODE INTERFEROMETRIC SENSORS | Non-Final OA | UNIVERSITY OF PITTSBURGH-OF THE COMMONWEALTH SYSTEM OF HIGHER EDUCATION |
| 18996477 | IMAGING ELLIPSOMETER FOR AREAL LAYER THICKNESS MEASUREMENT OF A SAMPLE AND METHOD USING AN IMAGING ELLIPSOMETER | Non-Final OA | TECHNISCHE UNIVERSITAET WIEN |
| 18993368 | DEVICE, APPARATUS, AND METHOD FOR CONFOCAL-CHROMATIC DISTANCE AND/OR THICKNESS MEASUREMENT | Final Rejection | MICRO-EPSILON Optronic GmbH |
| 18622193 | Multi-Modal Wide-Angle Illumination Employing a Compound Beam Combiner | Non-Final OA | Orbotech Ltd. |
| 18862592 | MINIATURIZED INTERFEROMETRIC INTEGRATED PHOTONIC GYROSCOPE | Non-Final OA | OSCPS MOTION SENSING INC. |
| 18117722 | APPARATUS FOR CHARACTERIZATION OF GRAPHENE OXIDE COATINGS | Final Rejection | Via Separations, Inc. |
| 18715720 | DEFLECTOMETRY MEASUREMENT METHOD | Non-Final OA | WYSE LIGHT |
| 18690967 | METHOD AND APPARATUS FOR QUALITY CONTROL OF OPHTHALMIC LENSES | Non-Final OA | Schneider GmbH & Co. KG |
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