Prosecution Insights
Last updated: October 27, 2026

Luz L Alejandro Mulero, USPTO Patent Examiner

Listed by the USPTO as ALEJANDRO MULERO, LUZ L

Tech Center 1700 • Art Units: 1716 1792

This examiner grants 48% of resolved cases

Analysis

ALEJANDRO MULERO, LUZ L works in tech center 1700 and art unit 1716. The profile records 434 resolved cases and an allowance rate of 47.9%. Median time to allowance is 1528 days. Interviews are associated with a 39.7% lift in the allowance rate, making examiner interviews a potentially important element of prosecution planning for this docket.

The listed companies are Lam Research Corporation, Applied Materials Inc., and Taiwan Semiconductor Manufacturing Company, Ltd. The listed firms are JCIPRNET, MILES & STOCKBRIDGE PC, and Snell & Wilmer (ASM IP Holding B.V.). These names identify reported experience relevant to art unit 1716.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

47.9%
Allow Rate
-17.1% vs TC avg
455
Total Applications
+39.7%
Interview Lift
1528
Avg Prosecution Days
Based on 434 resolved cases, 2023–2026

Rejection Statute Breakdown

0.2%
§101 Eligibility
16.3%
§102 Novelty
49.7%
§103 Obviousness
24.0%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
19032149 METHODS AND SYSTEM FOR PRECURSOR RECYCLING Non-Final OA ASM IP Holding B.V.
18278276 TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS Non-Final OA LAM RESEARCH CORPORATION
17927328 DISTRIBUTED PLASMA SOURCE ARRAY Final Rejection LAM RESEARCH CORPORATION
17800168 PLANAR MULTI-LAYER RADIO FREQUENCY FILTERS INCLUDING STACKED COILS WITH STRUCTURAL CAPACITANCE Final Rejection LAM RESEARCH CORPORATION
16642187 PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS Final Rejection Hitachi High-Technologies Corporation
17964621 INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD Final Rejection Applied Materials, Inc.
16898244 CLEAN UNIT FOR CHAMBER EXHAUST CLEANING Non-Final OA Applied Materials, Inc.
18472267 SEMICONDUCTOR PROCESSING APPARATUS FOR GENERATING PLASMA Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
16927638 Pre-Clean for Contacts Final Rejection Taiwan Semiconductor Manufacturing Co., Ltd.

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Frequently Asked Questions

What is examiner Luz L Alejandro Mulero's allowance rate?

47.9% of resolved applications examined by Luz L Alejandro Mulero were allowed (434 resolved cases), compared with 45.4% across Art Unit 1716 over the last five years.

Does an interview help with examiner Luz L Alejandro Mulero?

This examiner's interview lift is +39.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Luz L Alejandro Mulero take to allow a patent?

Applications allowed by Luz L Alejandro Mulero took 1,528 days on average from filing to allowance.

Which art unit does examiner Luz L Alejandro Mulero work in?

Luz L Alejandro Mulero examines applications in Art Unit 1716 in Tech Center 1700 (Chemistry & Materials).

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