Prosecution Insights
Prosecution Insights
Tech Center 3700 • Art Units: 1711 1714 1718 1749 3754
This examiner grants 76% of resolved cases
Tinsae B. Ayalew is an examiner in Tech Center 3700 and Art Unit 1711. He has managed 619 resolved cases with an allowance rate pct of 75.8%. This 75.8% rate indicates that a majority of the applications in his portfolio result in a grant. The median days to allowance for these cases is 967, which establishes a timeline for practitioners to expect when prosecuting in this art unit. For the 619 resolved cases, this 967-day period represents the median duration from filing to issuance for successful applications.
The data shows an interview lift pct of 9.1%. This 9.1% lift is an increase in the probability of allowance when an interview is conducted compared to the 75.8% baseline allowance rate. This suggests that direct communication with the examiner is a method for resolving outstanding rejections. Practitioners can use the 9.1% lift to evaluate the impact of an interview, as it correlates with a higher success rate than the baseline. The 967-day median suggests that the process in Art Unit 1711 is relatively efficient for the 619 resolved cases.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18879508 | CLOTHING TREATMENT APPARATUS | Non-Final OA | LG Electronics Inc. |
| 18701391 | LAUNDRY TREATING APPARATUS | Final Rejection | LG ELECTRONICS INC. |
| 18418827 | CHEMICAL SUPPLY APPARATUS, SEMICONDUCTOR FABRICATION SYSTEM INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18293502 | WIPING SYSTEM AND CONTROL OF CLEANING FLUID INJECTION IN A WIPING SYSTEM | Non-Final OA | VALEO SYSTEMES D'ESSUYAGE |
| 18647420 | TRAY COUPLING MODULE FOR A CLEANING MACHINE | Non-Final OA | Ecolab USA Inc. |
| 18959723 | WET PROCESS SYSTEM AND PROCESS FOR USING THE SAME | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18813870 | HORIZONTAL NON-CONTACT CLEAN STATION FOR CHEMICAN MECHANICAL POLISHING CLEANER | Non-Final OA | Applied Materials, Inc. |
| 19082876 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18799028 | MULTI-STAGE WASHER INCLUDING A WATER TREATMENT SYSTEM | Non-Final OA | Stolle Machinery Company, LLC |
| 18889420 | SUBSTRATE PROCESSING APPARATUS | Final Rejection | SCREEN HOLDINGS CO., LTD. |
| 18442486 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Non-Final OA | SEMES CO., LTD. |
| 18510663 | SUBSTRATE TREATING APPARATUS AND CLEANING METHOD THEREOF | Final Rejection | SEMES CO., LTD. |
| 18561531 | SEMICONDUCTOR WAFER CLEANING DEVICE, SEMICONDUCTOR WAFER CLEANING METHOD, AND METHOD FOR MANUFACTURING SILICON WAFER | Non-Final OA | SUMCO Corporation |
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