Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1717 2800 2877 2884 2896 2899
This examiner grants 85% of resolved cases
Hina F. Ayub is an examiner in Tech Center 2800 and Art Unit 1717. She has managed 712 resolved cases with an allowance rate pct of 84.8%. This 84.8% rate indicates that a large majority of the applications in her portfolio result in a grant. The median days to allowance for these cases is 830, which establishes a timeline for practitioners to expect when prosecuting in this art unit. For the 712 resolved cases, this 830-day period represents the median duration from filing to issuance for successful applications.
The data shows an interview lift pct of 17.4%. This 17.4% lift is an increase in the probability of allowance when an interview is conducted compared to the 84.8% baseline allowance rate. This suggests that direct communication with the examiner is a method for resolving outstanding rejections. Practitioners can use the 17.4% lift to evaluate the impact of an interview, as it correlates with a higher success rate than the baseline. The 830-day median suggests that the process in Art Unit 1717 is relatively efficient for the 712 resolved cases.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18353203 | INSPECTION APPARATUS AND INSPECTION SYSTEM | Non-Final OA | FUJIFILM Business Innovation Corp. |
| 19063309 | MEASURING APPARATUS AND MEASURING METHOD | Non-Final OA | RICOH COMPANY, LTD. |
| 18797104 | LIDAR DEVICE | Non-Final OA | LG INNOTEK CO., LTD. |
| 19057245 | OPTICAL FIBER CHARACTERISTIC MEASUREMENT APPARATUS AND OPTICAL FIBER CHARACTERISTIC MEASUREMENT METHOD | Non-Final OA | Yokogawa Electric Corporation |
| 18834898 | MEASUREMENT DEVICE | Non-Final OA | KOITO MANUFACTURING CO., LTD. |
| 18936104 | OPTICAL INSPECTION OF WAFER BEVELS USING MULTIPLE LIGHT SOURCES | Final Rejection | Applied Materials, Inc. |
| 19045861 | EVENT MONITORING AND DETECTION DEVICE TESTING | Non-Final OA | Honeywell International Inc. |
| 18935796 | METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING LIGHT REFLECTIVITY AND AN EFFECT OF A POLARIZATION OF MEASURING LIGHT ON A MEASURING LIGHT IMPINGEMENT ON A LITHOGRAPHY MASK | Final Rejection | Carl Zeiss SMT GmbH |
| 19098597 | RAMAN SPECTROSCOPIC SYSTEM FOR DETECTING HUMAN BODY FLUID TRACES ON AN INTERFERING SUBSTRATE | Non-Final OA | The Research Foundation for the State University of New York |
| 18862397 | OPTOFLUIDIC SENSOR, WATER-CONDUCTING HOUSEHOLD APPLIANCE AND METHOD FOR DETERMINING A CONCENTRATION | Final Rejection | ams Sensors Germany GmbH |
| 18812890 | Angle Of Incidence And Azimuth Angle Resolved Spectroscopic Ellipsometry For Semiconductor Metrology | Non-Final OA | KLA Corporation |
| 19101051 | SYSTEM AND APPARATUS FOR MEASURING SCATTERED LIGHT SIGNALS FROM PRESSURIZED SOLUTIONS AND METHOD OF ASSEMBLY | Non-Final OA | UNIVERSITY OF DELAWARE |
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