Listed by the USPTO as BOWEN, ADAM S
Tech Center 2800 • Art Units: 2897
This examiner grants 96% of resolved cases
BOWEN, ADAM S is assigned to tech center 2800 and art unit 2897. The record contains 748 resolved cases, with a 96.5% allowance rate and a median of 645 days to allowance. The 2.3% interview lift is positive but limited, indicating that the strong allowance result is not accompanied by a large measured interview effect.
The leading companies are Taiwan Semiconductor Manufacturing Company, Ltd., Robert Bosch GmbH, and Seiko Epson Corporation. The listed firms are STERNE, KESSLER, GOLDSTEIN & FOX P.L.L.C., Haynes and Boone, LLP (24061), and Cooper Legal Group LLC. The profile supports efficient prosecution planning centered on a high allowance rate and a 645-day median.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18648577 | METHOD FOR PRODUCING A VERTICAL FIELD-EFFECT TRANSISTOR STRUCTURE AND CORRESPONDING VERTICAL FIELD-EFFECT TRANSISTOR STRUCTURE | Non-Final OA | Robert Bosch GmbH |
| 18597930 | DISPLAY DEVICE AND ELECTRONIC APPARATUS | Non-Final OA | SEIKO EPSON CORPORATION |
| 18734746 | CAPACITOR DIE EMBEDDED IN PACKAGE SUBSTRATE FOR PROVIDING CAPACITANCE TO SURFACE MOUNTED DIE | Non-Final OA | Intel Corporation |
| 18785488 | SELECTIVE DUAL SILICIDE FORMATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18772382 | CELL PLACEMENT OPTIMIZATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18770367 | SOURCE/DRAIN EPITAXIAL STRUCTURES FOR SEMICONDUCTOR DEVICES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18766003 | STRUCTURE AND METHOD FOR FINFET DEVICE WITH SOURCE/DRAIN MODULATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18741963 | Contact Structures In Semiconductor Devices | Non-Final OA | Taiwan Semiconductor Manufacturing Company, LTD. |
| 18673432 | SOURCE/DRAIN EPI STRUCTURE FOR IMPROVING CONTACT QUALITY | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18784570 | SEMICONDUCTOR DEVICES | Non-Final OA | Taiwan Semiconductor Manufacturing Co, Ltd. |
| 18775943 | SEMICONDUCTOR DEVICE AND METHODS OF FORMING | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18774643 | Semiconductor Device with Cut Metal Gate and Method of Manufacture | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18771714 | GATE STRUCTURES IN TRANSISTOR DEVICES AND METHODS OF FORMING SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18671732 | Contact Structures With Deposited Silicide Layers | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18662374 | DUAL SILICIDE STRUCTURE AND METHODS THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18601074 | GATE-ALL-AROUND DEVICE WITH DIFFERENT CHANNEL SEMICONDUCTOR MATERIALS AND METHOD OF FORMING THE SAME | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy96.5% of resolved applications examined by Adam S Bowen were allowed (748 resolved cases), compared with 82.9% across Art Unit 2897 over the last five years.
This examiner's interview lift is +2.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Adam S Bowen took 645 days on average from filing to allowance.
Adam S Bowen examines applications in Art Unit 2897 in Tech Center 2800 (Semiconductors, Circuits & Optics).
