Listed by the USPTO as BRAYTON, JOHN JOSEPH
Tech Center 2800 • Art Units: 1713 1724 1728 1756 1794 1795 2899
This examiner grants 48% of resolved cases
BRAYTON, JOHN JOSEPH works in Tech Center 2800 and art unit 1713, with 720 resolved cases. The allowance rate is 48.3%, and the median time to allowance is 1412 days. The interview lift is 22.4%, showing a positive association between interviews and allowance in a record with a longer prosecution timeline.
The listed companies are Tokyo Electron Limited, Samsung Electronics Co., Ltd., and ASM IP Holding B.V. The listed firms are OBLON, MCCLELLAND, MAIER & NEUSTADT, L.L.P., Studebaker Brackett PLLC, and BANNER & WITCOFF, LTD. Practitioners should plan for sustained prosecution and consider interviews when developing responses to persistent claim issues.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18747933 | PLASMA GENERATION CIRCUIT AND SUBSTRATE PROCESSING DEVICE INCLUDING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18414681 | SUBSTRATE PROCESSING APPARATUS | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18362404 | WAFER BOAT AND A METHOD FOR FORMING LAYER ON A PLURALITY OF SUBSTRATES | Non-Final OA | ASM IP Holding B.V. |
| 18346608 | SEMICONDUCTOR PROCESSING APPARATUS FOR PROCESSING A PLURALITY OF SUBSTRATES WITH CROSS FLOW | Non-Final OA | ASM IP Holding, B.V |
| 18332886 | TREATEMENT OF A POROUS TRANSPORT LAYER FOR USE IN AN ELECTROYLYZER | Non-Final OA | The Regents of the University of California |
| 18913135 | METHOD FOR SEMICONDUCTOR MANUFACTURING | Non-Final OA | Tokyo Electron Limited |
| 18510273 | PLASMA PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 18479986 | PLASMA PROCESSING SYSTEM, PLASMA PROCESSING APPARATUS, AND ETCHING METHOD | Final Rejection | Tokyo Electron Limited |
| 18424156 | SUSCEPTOR WITH A TEXTURED SURFACE | Non-Final OA | Applied Materials, Inc. |
| 18787321 | METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18758212 | ETCHING APPARATUS AND METHODS OF CLEANING THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18505581 | SUBSTRATE ATTACHING/DETACHING ROBOT, SUBSTRATE ATTACHING/DETACHING METHOD, AND FILM FORMATION APPARATUS | Final Rejection | Resonac Corporation |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy48.3% of resolved applications examined by John Joseph Brayton were allowed (720 resolved cases), compared with 62.4% across Art Unit 1713 over the last five years.
This examiner's interview lift is +22.4 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by John Joseph Brayton took 1,412 days on average from filing to allowance.
John Joseph Brayton examines applications in Art Unit 1713 in Tech Center 2800 (Semiconductors, Circuits & Optics).
