Listed by the USPTO as CHEN, BRET P
Tech Center 3700 • Art Units: 1715 1718 1784 1789 1792 1795 2818 2837 2899 3774
This examiner grants 84% of resolved cases
CHEN, BRET P is a USPTO patent examiner in tech center 3700 and art unit 1715. The profile covers 1156 resolved cases, an allowance rate of 84.5%, and a median of 960 days to allowance. The interview lift is 16.3%, showing a positive association between interviews and allowance outcomes while remaining smaller than the overall allowance measure.
The listed companies are Lam Research Corporation, Applied Materials Inc., and Tokyo Electron Limited. The listed firms are VOLPE KOENIG, HARNESS, DICKEY & PIERCE, P.L.C., and IP & T GROUP LLP. The combination of extensive examination history and semiconductor-focused applicants makes the profile useful for prosecution planning in related technology matters.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19021901 | METHOD FOR SELECTIVE DEPOSITION OF METAL LAYER | Non-Final OA | University-Industry Cooperation Group Of Kyung Hee University |
| 19110207 | LAYERED METAL OXIDE-SILICON OXIDE FILMS | Non-Final OA | Lam Research Corporation |
| 18837560 | LOW RESISTANCE MOLYBDENUM DEPOSITION FOR LOGIC SOURCE/DRAIN CONTACTS | Non-Final OA | Lam Research Corporation |
| 19210017 | FILM FORMING METHOD AND PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18556569 | FILM FORMING METHOD AND FILM FORMING APPARATUS | Final Rejection | TOKYO ELECTRON LIMITED |
| 18628243 | ENVIRONMENTAL BARRIER COATINGS | Non-Final OA | RTX CORPORATION |
| 18790596 | POST-GAP FILL TREATMENT FOR SEAM REDUCTION | Non-Final OA | Applied Materials, Inc. |
| 18666435 | RF PULSING ASSISTED LOW-K MATERIAL DEPOSITION WITH HIGH DENSITY | Non-Final OA | Applied Materials, Inc. |
| 19228490 | METHOD FOR DEPOSITING TARGET MATERIAL IN DEPOSITION CHAMBER WITH TILTABLE WORKPIECE HOLDER | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy84.5% of resolved applications examined by Bret P Chen were allowed (1,156 resolved cases), compared with 51.6% across Art Unit 1715 over the last five years.
This examiner's interview lift is +16.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Bret P Chen took 960 days on average from filing to allowance.
Bret P Chen examines applications in Art Unit 1715 in Tech Center 3700 (Medical Devices & Mechanical Engineering).
