Listed by the USPTO as EMPIE, NATHAN H
Tech Center 4100 • Art Units: 1712 1726 1749 1784 1787 1789 1792 4100
This examiner grants 43% of resolved cases
EMPIE, NATHAN H examines in tech center 4100 and art unit 1712. The profile contains 731 resolved cases and an allowance rate of 43.4%. The median time to allowance is 1326 days. The recorded allowance rate is below half, while the median duration indicates that applications may require sustained prosecution before an allowance is reached.
The interview lift is 43.3%, showing a strong positive association with allowance outcomes. The top companies are Safran S.A., Tokyo Electron Limited, and View Inc. The listed firms are Cabinet Beau de Lomenie, HAUPTMAN HAM, LLP, and BACON & THOMAS, PLLC. Practitioners may consider interviews an important part of a broader response strategy, particularly where claim scope and technical distinctions can be explained directly.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19093269 | MANUFACTURING METHOD OF ELECTRODE LAYER | Non-Final OA | FUJIFILM CORPORATION |
| 18688033 | METHOD FOR PROTECTING A CARBON/CARBON COMPOSITE MATERIAL PART FROM OXIDATION | Non-Final OA | SAFRAN LANDING SYSTEMS |
| 18003042 | METHOD FOR MANUFACTURING AN ENVIRONMENTAL BARRIER | Final Rejection | SAFRAN CERAMICS |
| 18837336 | METHODS AND SYSTEMS OF ROLL COATING | Final Rejection | 3M INNOVATIVE PROPERTIES COMPANY |
| 19559279 | ULTRA SOFT CUTTING TOOL COATINGS AND COATING METHOD | Non-Final OA | McMaster University |
| 18644466 | GLASS ARTICLE FOR A DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18889069 | SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES | Non-Final OA | ASM IP Holding B.V. |
| 18713068 | DEPOSITION OF HIGH COMPRESSIVE STRESS THERMALLY STABLE NITRIDE FILM | Final Rejection | Lam Research Corporation |
| 19272175 | SUBSTRATE PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 19096492 | AREA SELECTIVE DEPOSITION USING METAL CARBONYL PRECURSORS | Non-Final OA | Tokyo Electron Limited |
| 18851942 | COATING METHOD AND SHEET MATERIAL | Final Rejection | NHK SPRING CO., LTD. |
| 19036670 | COLD SPRAYING COATING ONTO TURBINE ENGINE COMPONENT | Final Rejection | RTX Corporation |
| 18756396 | METHODS OF DEPOSITING SILICON-CONTAINING FILMS FOR SEMICONDUCTOR DEVICES | Non-Final OA | Applied Materials, Inc. |
| 18595374 | SEGMENTED FORMATION OF GATE INTERFACE | Non-Final OA | Applied Materials, Inc. |
| 18791201 | SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18041256 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Final Rejection | EBARA CORPORATION |
| 17554657 | INTRODUCTION OF METALLIC PARTICLES TO ENABLE FORMATION OF METALLIC CARBIDES IN A MATRIX | Non-Final OA | Raytheon Technologies Corporation |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy43.4% of resolved applications examined by Nathan H Empie were allowed (731 resolved cases), compared with 43.3% across Art Unit 1712 over the last five years.
This examiner's interview lift is +43.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Nathan H Empie took 1,326 days on average from filing to allowance.
Nathan H Empie examines applications in Art Unit 1712 in Tech Center 4100.
