Tech Center 4100 • Art Units: 1712 1726 1749 1784 1787 1789 1792 3794 4100
This examiner grants 44% of resolved cases
Nathan H. Empie, working in Art Unit 1712 and Tech Center 4100, has managed 728 resolved cases. The examiner maintains an allowance rate of 43.5 percent. Applications that reach allowance typically face a median pendency of 1326 days. This 1326 days figure suggests that applicants should prepare for a multi-year prosecution cycle when seeking a patent grant from this examiner.
There is a strong positive correlation between interviews and successful outcomes, as evidenced by an interview lift of 43.1 percent. This suggests that direct communication is a critical factor in overcoming examiner objections. With 728 resolved cases, the data provides a reliable indication that interviews significantly enhance the chances of securing an allowance. The 43.1 percent lift provides a meaningful advantage for practitioners who choose to engage in direct discussion. The 43.5 percent allowance rate serves as a baseline that is notably improved when oral advocacy is utilized.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18688033 | METHOD FOR PROTECTING A CARBON/CARBON COMPOSITE MATERIAL PART FROM OXIDATION | Non-Final OA | SAFRAN LANDING SYSTEMS |
| 18003042 | METHOD FOR MANUFACTURING AN ENVIRONMENTAL BARRIER | Final Rejection | SAFRAN CERAMICS |
| 18644466 | GLASS ARTICLE FOR A DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 19093269 | MANUFACTURING METHOD OF ELECTRODE LAYER | Non-Final OA | FUJIFILM CORPORATION |
| 18186844 | SELF HEALING OPS THROUGH VISCOSITY LOWERING | Non-Final OA | Goodrich Corporation |
| 18470285 | MANUFACTURING METHOD OF SECONDARY BATTERY | Non-Final OA | Samsung SDI Co., Ltd. |
| 18710382 | Spray Pyrolysis of Li-Salt Films | Final Rejection | Massachusetts Institute of Technology |
| 19036670 | COLD SPRAYING COATING ONTO TURBINE ENGINE COMPONENT | Final Rejection | RTX Corporation |
| 18713068 | DEPOSITION OF HIGH COMPRESSIVE STRESS THERMALLY STABLE NITRIDE FILM | Final Rejection | Lam Research Corporation |
| 18595374 | SEGMENTED FORMATION OF GATE INTERFACE | Non-Final OA | Applied Materials, Inc. |
| 18851942 | COATING METHOD AND SHEET MATERIAL | Final Rejection | NHK SPRING CO., LTD. |
| 19272175 | SUBSTRATE PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 19096492 | AREA SELECTIVE DEPOSITION USING METAL CARBONYL PRECURSORS | Non-Final OA | Tokyo Electron Limited |
| 19242729 | PHOTORESIST PASSIVATION OF DEFECTS IN PEROVSKITE LAYERS | Final Rejection | Alliance for Energy Innovation, LLC |
| 18041256 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Final Rejection | EBARA CORPORATION |
| 17661526 | SACRIFICIAL LAYER FOR ELECTROCHROMIC DEVICE FABRICATION | Non-Final OA | View, Inc. |
| 16306511 | SACRIFICIAL LAYER FOR ELECTROCHROMIC DEVICE FABRICATION | Non-Final OA | View, Inc. |
| 18707133 | METHOD FOR DEPOSITING AN ENVIRONMENTAL BARRIER ON A PART MADE OF COMPOSITE MATERIAL HAVING A CERAMIC MATRIX | Non-Final OA | UNIVERSITE DE BORDEAUX |
| 18123040 | THREE-DIMENSIONAL WEAVE WITH SACRIFICIAL Z-FIBERS FOR IMPROVED CERAMIC MATRIX COMPOSITE MICROSTRUCTURE | Non-Final OA | Raytheon Technologies Corporation |
| 17554657 | INTRODUCTION OF METALLIC PARTICLES TO ENABLE FORMATION OF METALLIC CARBIDES IN A MATRIX | Non-Final OA | Raytheon Technologies Corporation |
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