Prosecution Insights
Last updated: October 02, 2026

Examiner: EMPIE, NATHAN H

Tech Center 4100 • Art Units: 1712 1726 1749 1784 1787 1789 1792 3794 4100

This examiner grants 44% of resolved cases

Analysis

Nathan H. Empie, working in Art Unit 1712 and Tech Center 4100, has managed 728 resolved cases. The examiner maintains an allowance rate of 43.5 percent. Applications that reach allowance typically face a median pendency of 1326 days. This 1326 days figure suggests that applicants should prepare for a multi-year prosecution cycle when seeking a patent grant from this examiner.

There is a strong positive correlation between interviews and successful outcomes, as evidenced by an interview lift of 43.1 percent. This suggests that direct communication is a critical factor in overcoming examiner objections. With 728 resolved cases, the data provides a reliable indication that interviews significantly enhance the chances of securing an allowance. The 43.1 percent lift provides a meaningful advantage for practitioners who choose to engage in direct discussion. The 43.5 percent allowance rate serves as a baseline that is notably improved when oral advocacy is utilized.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

43.5%
Allow Rate
-16.5% vs TC avg
773
Total Applications
+43.1%
Interview Lift
1326
Avg Prosecution Days
Based on 728 resolved cases, 2023–2026

Rejection Statute Breakdown

0.5%
§101 Eligibility
13.0%
§102 Novelty
54.4%
§103 Obviousness
26.6%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18688033 METHOD FOR PROTECTING A CARBON/CARBON COMPOSITE MATERIAL PART FROM OXIDATION Non-Final OA SAFRAN LANDING SYSTEMS
18003042 METHOD FOR MANUFACTURING AN ENVIRONMENTAL BARRIER Final Rejection SAFRAN CERAMICS
18644466 GLASS ARTICLE FOR A DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME Non-Final OA Samsung Display Co., LTD.
19093269 MANUFACTURING METHOD OF ELECTRODE LAYER Non-Final OA FUJIFILM CORPORATION
18186844 SELF HEALING OPS THROUGH VISCOSITY LOWERING Non-Final OA Goodrich Corporation
18470285 MANUFACTURING METHOD OF SECONDARY BATTERY Non-Final OA Samsung SDI Co., Ltd.
18710382 Spray Pyrolysis of Li-Salt Films Final Rejection Massachusetts Institute of Technology
19036670 COLD SPRAYING COATING ONTO TURBINE ENGINE COMPONENT Final Rejection RTX Corporation
18713068 DEPOSITION OF HIGH COMPRESSIVE STRESS THERMALLY STABLE NITRIDE FILM Final Rejection Lam Research Corporation
18595374 SEGMENTED FORMATION OF GATE INTERFACE Non-Final OA Applied Materials, Inc.
18851942 COATING METHOD AND SHEET MATERIAL Final Rejection NHK SPRING CO., LTD.
19272175 SUBSTRATE PROCESSING METHOD Non-Final OA Tokyo Electron Limited
19096492 AREA SELECTIVE DEPOSITION USING METAL CARBONYL PRECURSORS Non-Final OA Tokyo Electron Limited
19242729 PHOTORESIST PASSIVATION OF DEFECTS IN PEROVSKITE LAYERS Final Rejection Alliance for Energy Innovation, LLC
18041256 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS Final Rejection EBARA CORPORATION
17661526 SACRIFICIAL LAYER FOR ELECTROCHROMIC DEVICE FABRICATION Non-Final OA View, Inc.
16306511 SACRIFICIAL LAYER FOR ELECTROCHROMIC DEVICE FABRICATION Non-Final OA View, Inc.
18707133 METHOD FOR DEPOSITING AN ENVIRONMENTAL BARRIER ON A PART MADE OF COMPOSITE MATERIAL HAVING A CERAMIC MATRIX Non-Final OA UNIVERSITE DE BORDEAUX
18123040 THREE-DIMENSIONAL WEAVE WITH SACRIFICIAL Z-FIBERS FOR IMPROVED CERAMIC MATRIX COMPOSITE MICROSTRUCTURE Non-Final OA Raytheon Technologies Corporation
17554657 INTRODUCTION OF METALLIC PARTICLES TO ENABLE FORMATION OF METALLIC CARBIDES IN A MATRIX Non-Final OA Raytheon Technologies Corporation

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