Listed by the USPTO as FORD, NATHAN K
Tech Center 1700 • Art Units: 1712 1716 1718 1792
This examiner grants 33% of resolved cases
FORD, NATHAN K has resolved 677 cases in tech center 1700 and art unit 1712. The allowance rate is 32.6%, and the median time to allowance is 1605 days. The profile reflects a lower allowance outcome and the longest median prosecution timeline in the supplied data, making early evaluation of claim scope and fallback positions important.
Interviews correspond to a 35.2% lift in allowance outcomes. Lam Research Corporation, Applied Materials Inc., and ASM IP Holding B.V. are the leading companies listed. Snell & Wilmer (ASM IP Holding B.V.), OSTROLENK FABER LLP, and Anova Law Group, PLLC are the leading firms shown. These conditions support deliberate interview and amendment planning.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18642124 | INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18303833 | METHOD OF FABRICATING AN ELECTRODE STRUCTURE AND APPARATUS FOR FABRICATING THE ELECTRODE STRUCTURE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18733178 | MASK FRAME AND MASK ASSEMBLY HAVING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18522152 | LOAD LOCK ARRANGEMENTS, SEMICONDUCTOR PROCESSING SYSTEMS HAVING LOAD LOCK ARRANGEMENTS, AND METHODS OF MAKING LOAD LOCKS FOR SEMICONDUCTOR PROCESSING SYSTEMS | Final Rejection | ASM IP Holding B.V. |
| 17971829 | PLASMA CVD APPARATUS WITH A BEVEL MASK WITH A PLANAR INNER EDGE | Final Rejection | ASM IP Holding B.V. |
| 17948674 | SYSTEM AND APPARATUS FOR GAS DISTRIBUTION | Non-Final OA | ASM IP Holding, B.V. |
| 17739493 | CVD APPARATUS AND FILM FORMING METHOD | Non-Final OA | ASM IP Holding B.V. |
| 18465113 | APPARATUSES AND METHODS FOR AVOIDING ELECTRICAL BREAKDOWN FROM RF TERMINAL TO ADJACENT NON-RF TERMINAL | Non-Final OA | Lam Research Corporation |
| 18017208 | THIN SHADOW RING FOR LOW-TILT TRENCH ETCHING | Final Rejection | LAM RESEARCH CORPORATION |
| 18011707 | DRY BACKSIDE AND BEVEL EDGE CLEAN OF PHOTORESIST | Final Rejection | Lam Research Corporation |
| 17904005 | COOLING PLATE FOR SEMICONDUCTOR PROCESSING CHAMBER WINDOW | Non-Final OA | Lam Research Corporation |
| 17419841 | METAL ATOMIC LAYER ETCH AND DEPOSITION APPARATUSES AND PROCESSES WITH METAL-FREE LIGANDS | Non-Final OA | LAM RESEARCH CORPORATION |
| 17872498 | Equipment For Manufacturing Light-Emitting Device and Light-Receiving Device | Final Rejection | Semiconductor Energy Laboratory Co., Ltd. |
| 17736048 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18538100 | CHAMBER AND METHODS FOR DOWNSTREAM RESIDUE MANAGEMENT | Final Rejection | Applied Materials, Inc. |
| 18239988 | In-Vacuum Rotatable RF Component | Final Rejection | Applied Materials, Inc. |
| 18223183 | SINGLE PIECE OR TWO PIECE SUSCEPTOR | Final Rejection | Applied Materials, Inc. |
| 18168168 | PROCESSING SYSTEM AND METHODS TO CO-STRIKE PLASMA TO ENHANCE TUNGSTEN GROWTH INCUBATION DELAY | Final Rejection | Applied Materials, Inc. |
| 18095262 | MODULAR PRECURSOR DELIVERY AND SPLITTING FOR FAST SWITCHING | Final Rejection | Applied Materials, Inc. |
| 19126547 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 18742608 | SUBSTRATE TREATING APPARATUS AND SUBSTRATE TRANSPORTING METHOD | Non-Final OA | SCREEN Holdings Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy32.6% of resolved applications examined by Nathan K Ford were allowed (677 resolved cases), compared with 43.3% across Art Unit 1712 over the last five years.
This examiner's interview lift is +35.2 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Nathan K Ford took 1,605 days on average from filing to allowance.
Nathan K Ford examines applications in Art Unit 1712 in Tech Center 1700 (Chemistry & Materials).
