Technology area: Semiconductors, Circuits & Optics
6 pending office actions • 1 client • 6 examiners • 4 art units • 0 of 6 (0%) have an AI response strategy ready • 24 patents granted in the last 365 days
Nields, Lemack & Frame, LLC - Varian records 6 pending office actions in Semiconductors, Circuits & Optics and 283 career applications. The profile shows a contained active docket with a focused historical application record.
The resolved allowance rate is 97.06%, and the average office actions per allowance is 2.72. The allowance figure indicates that nearly all resolved matters reached allowance, while the action average shows that allowed matters still involved recurring examination activity.
For practitioners, the profile supports close review of how semiconductor and circuit claims were distinguished and advanced. The pending matters should be assessed individually, with attention to technical evidence, claim amendments, and the relationship between examination persistence and eventual allowance.
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 1 (17%) |
| §102 only | 1 (17%) |
| Multi-statute (no §101) | 4 (67%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| KING, MONICA C | 1 | 84.6% | +6.6% |
| VANORE, DAVID A | 1 | 88.8% | +7.6% |
| LOGIE, MICHAEL J | 1 | 63.1% | +9.5% |
| FORD, NATHAN K | 1 | 32.6% | +35.2% |
| GOURLIE, LAURA ELOISE | 1 | 68.8% | +33.3% |
| STOFFA, WYATT A | 1 | 79.3% | +22.3% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19261609 | ION SOURCE FOR CONTROLLING DECOMPOSITION BUILDUP USING CHLORINE CO-GAS | KING, MONICA C | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18239988 | In-Vacuum Rotatable RF Component | FORD, NATHAN K | 29d |
| 18633764 | Detection of Space Charge Effect During Ion Implantation | VANORE, DAVID A | — |
| 18387987 | XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER | LOGIE, MICHAEL J | — |
| 17740848 | HYBRID ION SOURCE FOR ALUMINUM ION GENERATION USING A TARGET HOLDER AND ORGANOALUMINIUM COMPOUNDS | STOFFA, WYATT A | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18107819 | System and Method for Reducing Particle Formation in a Process Chamber of an Ion Implanter | GOURLIE, LAURA ELOISE | 43d overdue |
| 18239988 | In-Vacuum Rotatable RF Component | FORD, NATHAN K | 29d |
| 17740848 | HYBRID ION SOURCE FOR ALUMINUM ION GENERATION USING A TARGET HOLDER AND ORGANOALUMINIUM COMPOUNDS | STOFFA, WYATT A | — |
| Client (Assignee) | Pending OAs |
|---|---|
| Applied Materials | 6 |
| Art Unit | Apps |
|---|---|
| 2881 | 3 |
| 2845 | 1 |
| 2878 | 1 |
| 1716 | 1 |
| App # | Title | Client | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|---|
| 19261609 | ION SOURCE FOR CONTROLLING DECOMPOSITION BUILDUP USING CHLORINE CO-GAS | Applied Materials, Inc. | KING, MONICA C | 2845 | §102Other | Non-Final OA | — | Pending | Jul 07, 2025 |
| 18633764 | Detection of Space Charge Effect During Ion Implantation | Applied Materials, Inc. | VANORE, DAVID A | 2878 | §102§112 | Non-Final OA | — | Pending | Apr 12, 2024 |
| 18387987 | XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER | Applied Materials, Inc. | LOGIE, MICHAEL J | 2881 | §103§112 | Non-Final OA | — | Pending | Nov 08, 2023 |
| 18239988 | In-Vacuum Rotatable RF Component | Applied Materials, Inc. | FORD, NATHAN K | 1716 | §102§103 | Final Rejection | 29d | Pending | Aug 30, 2023 |
| 18107819 | System and Method for Reducing Particle Formation in a Process Chamber of an Ion Implanter | Applied Materials, Inc. | GOURLIE, LAURA ELOISE | 2881 | §103 | Final Rejection | 43d overdue | Pending | Feb 09, 2023 |
| 17740848 | HYBRID ION SOURCE FOR ALUMINUM ION GENERATION USING A TARGET HOLDER AND ORGANOALUMINIUM COMPOUNDS | Applied Materials, Inc. | STOFFA, WYATT A | 2881 | §102§103Other | Non-Final OA | — | Pending | May 10, 2022 |
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Start Free Trial97.1% of resolved applications prosecuted by Nields, Lemack & Frame, LLC - Varian were allowed, across 283 applications in USPTO records.
2.72 office actions per allowed application on average.
6 pending office actions as of October 2026, for 1 client, before 6 examiners in 4 art units.
