Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2863 2881
This examiner grants 80% of resolved cases
Christopher J. Gassen serves in Art Unit 2863 of Tech Center 2800 and has overseen 137 resolved cases. His allowance rate is 79.6 percent. The median days to allowance of 1027 suggests a timeline for successful applications. This 1027-day figure provides an estimate for the time required to secure a patent grant.
The interview lift of 25.0 percent is an increase relative to the 79.6 percent allowance rate. This suggests that an interview is a way to push a case toward allowance. For the 137 cases resolved, Gassen appears to be responsive to direct communication. Practitioners should use interviews to capitalize on this 25.0 percent lift and potentially expedite the 1027-day median process through verbal clarification. The 79.6 percent allowance rate remains the baseline for success in Art Unit 2863.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18634129 | USE OF OPTICAL POLARIZATION STATES TO CONTROL A PONDEROMOTIVE PHASE PLATE | Non-Final OA | The Regents of the University of California |
| 18890047 | DETECTION DEVICE | Non-Final OA | Japan Display Inc. |
| 18888725 | QUANTUM RANDOM NUMBER GENERATION DEVICE | Non-Final OA | Mitsubishi Electric Corporation |
| 18837969 | NUCLEAR REACTOR SHIELDING FACILITY, NUCLEAR FACILITY, AND NUCLEAR REACTOR SHIELDING FACILITY CONSTRUCTION METHOD | Non-Final OA | MITSUBISHI HEAVY INDUSTRIES, LTD. |
| 18522651 | DETECTOR | Non-Final OA | Sharp Display Technology Corporation |
| 18261484 | LIGHT IRRADIATOR | Non-Final OA | KYOCERA CORPORATION |
| 18272948 | METHOD AND APPARATUS FOR A POLYMER ELECTROSPRAY EMITTER | Non-Final OA | Massachusetts Institute of Technology |
| 18293408 | DEVICE, SYSTEM AND METHOD FOR DETERMINING DEGRADATION | Final Rejection | NTT, Inc. |
| 18257941 | ION SOURCE, MASS SPECTROMETER, AND CAPILLARY INSERTION METHOD | Final Rejection | HITACHI HIGH-TECH CORPORATION |
| 18384253 | SEMICONDUCTOR PROCESS APPARATUS AND METHOD | Final Rejection | Taiwan Semiconductor Manufacturing Company LTD |
| 18904192 | APPARATUS FOR ION ENERGY ANALYSIS OF PLASMA PROCESSES | Non-Final OA | Applied Materials, Inc. |
| 18388490 | ION ANGLE SENSOR | Non-Final OA | Applied Materials, Inc. |
| 18350522 | OPTICAL ELEMENT FOR REFLECTING RADIATION, AND OPTICAL ASSEMBLY | Non-Final OA | Carl Zeiss SMT GmbH |
| 18871448 | ISOLATING SPACER FOR ELECTRON-OPTICAL ASSEMBLY | Non-Final OA | ASML NETHERLANDS B.V. |
| 18716468 | APERTURE AND METHOD | Non-Final OA | ASML Netherlands B.V. |
| 18016811 | METHOD AND APPARATUS FOR IDENTIFYING CONTAMINATION IN A SEMICONDUCTOR FAB | Non-Final OA | ASML NETHERLANDS B.V. |
| 18506957 | MINIMIZATION OF ENERGY SPREAD IN FOCUSED ION BEAM (FIB) SYSTEMS | Final Rejection | FEI Company |
| 18205131 | AUTOMATED INLINE NANOPARTICLE STANDARD MATERIAL ADDITION | Non-Final OA | Elemental Scientific, Inc. |
| 18409972 | Systems, Methods and Computer Program Products for Charging Autonomous Wireless Sensors in Subsurface Environments | Final Rejection | Wayne State University |
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