Prosecution Insights
Last updated: October 04, 2026

Examiner: KIM, ROBERT H

Tech Center 2800 • Art Units: 2800 2881

This examiner grants 53% of resolved cases

Analysis

Robert H Kim serves as a patent examiner in Tech Center 2800, specifically within Art Unit 2800. Throughout his tenure, he has overseen 55 resolved cases. His current allowance rate stands at 52.7 percent, which provides a baseline for practitioners evaluating the likelihood of a successful outcome. The median days to allowance for applications under his review is 1089, reflecting the prosecution cycle for those seeking patent protection in this specific art area.

A critical data point for strategy is the interview lift of 24.1 percent. This metric demonstrates that conducting an interview with the examiner is associated with a higher probability of allowance than the overall 52.7 percent rate. For applicants facing the 1089 day median pendency, this 24.1 percent lift suggests that verbal advocacy is an effective mechanism for resolving issues. The 55 resolved cases provide the data for these performance metrics, establishing a profile for the examiner's behavior in Tech Center 2800.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

52.7%
Allow Rate
-15.3% vs TC avg
73
Total Applications
+24.1%
Interview Lift
1089
Avg Prosecution Days
Based on 55 resolved cases, 2023–2026

Rejection Statute Breakdown

1.9%
§101 Eligibility
27.1%
§102 Novelty
50.9%
§103 Obviousness
16.8%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
17859894 STORAGE AND DRAINAGE MECHANISM, LIGHT SOURCE APPARATUS, AND STORAGE AND DRAINAGE METHOD Final Rejection Ushio Denki Kabushiki Kaisha
17538563 SEMICONDUCTOR MANUFACTURING DEVICE WITH EMBEDDED FLUID CONDUITS Final Rejection Varian Semiconductor Equipment Associates, Inc.
18948178 METHODS AND SYSTEMS FOR GENERATING HIGH-CONTRAST ARRAYS Non-Final OA Atom Computing Inc.
18114674 METHOD AND APPARATUS OF MASS ANALYSING POSITIVELY CHARGED IONS AND NEGATIVELY CHARGED IONS Final Rejection TOFWERK AG

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