Prosecution Insights
Prosecution Insights
Listed by the USPTO as KUYKENDALL, ALYSSA LEE
Tech Center 1700 • Art Units: 1692 1732 1736 1774
This examiner grants 21% of resolved cases
Alyssa Lee Kuykendall is an examiner in Tech Center 1700, specifically in Art Unit 1692. She has handled 24 resolved cases to date. The allowance rate is 20.8 percent, which is quite low and indicates a very challenging examination environment. Practitioners should be prepared for a rigorous process and a high likelihood of rejection. The 20.8 percent rate suggests that only a small portion of applications reach a grant under this examiner's review.
The interview lift is an extraordinary 95.0 percent. This figure is exceptionally high and suggests that almost every allowance granted by this examiner involved an interview. The median time to allowance is 1347 days. This is a long prosecution timeline, which is consistent with the low allowance rate. However, the 95.0 percent lift provides a critical strategic insight: an interview is essentially a requirement for success. Practitioners should plan for an interview as early as possible to overcome the 20.8 percent baseline allowance rate. Navigating the 1347 days of median pendency will likely require persistent and direct engagement with the examiner.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18474322 | REACTOR | Non-Final OA | NGK INSULATORS, LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy20.8% of resolved applications examined by Alyssa Lee Kuykendall were allowed (24 resolved cases), compared with 71.5% across Art Unit 1692 over the last five years.
This examiner's interview lift is +95.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Alyssa Lee Kuykendall took 1,347 days on average from filing to allowance.
Alyssa Lee Kuykendall examines applications in Art Unit 1692 in Tech Center 1700 (Chemistry & Materials).