Listed by the USPTO as LE, HOA T
Tech Center 1700 • Art Units: 1717 1718 1732 1743 1754 1759 1784 1787 1788 1794
This examiner grants 73% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18357600 | HEAT DISSIPATION SHEET FOR ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREFOR | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18842222 | STRUCTURE AND METHOD OF MANUFACTURING STRUCTURE | Non-Final OA | Sony Group Corporation |
| 18845352 | GLASS FIBER BOARD, BACK COVER, ELECTRONIC DEVICE, AND PREPARATION METHOD FOR GLASS FIBER BOARD | Non-Final OA | HONOR DEVICE CO., LTD. |
| 18990315 | FILM AND METHOD FOR PRODUCING SAME | Non-Final OA | Murata Manufacturing Co., Ltd. |
| 18601370 | LIQUID CRYSTAL POLYMER PELLET, LIQUID CRYSTAL POLYMER POWDER, LIQUID CRYSTAL POLYMER FILM, AND METHOD OF PRODUCING SAME | Final Rejection | Murata Manufacturing Co., Ltd. |
| 18283795 | SINGLE-CRYSTAL DIAMOND AND DIAMOND COMPOSITE CONTAINING THE SAME | Final Rejection | SUMITOMO ELECTRIC INDUSTRIES, LTD. |
| 18781101 | MICROSTRUCTURE CONTROL OF CONDUCTING MATERIALS THROUGH SURFACE COATING OF POWDERS | Non-Final OA | Applied Materials, Inc. |
| 18419327 | DIFFUSION CONTROLLED REACTION BASED ALLOYING ANODES THROUGH NANOSTRUCTURING | Final Rejection | KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION |
| 17801420 | BALLISTIC COMPOSITION, BALLISTIC ASSEMBLY, AND METHOD THEREFOR | Non-Final OA | Zephyros, Inc. |
| 18098358 | Method to Promote Adhesion of Plastic and Oil-Bleeding Liquid Silicone | Final Rejection | Tyco Electronics (Shanghai) Co., Ltd. |
| 18682231 | ORGANIC-INORGANIC HYBRID INFRARED ABSORBING PARTICLES, INFRARED ABSORBING PARTICLE DISPERSION, AND METHOD OF PRODUCING ORGANIC-INORGANIC HYBRID INFRARED ABSORBING PARTICLES | Final Rejection | SUMITOMO METAL MINING CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy72.7% of resolved applications examined by Hoa T Le were allowed (1,101 resolved cases), compared with 49.3% across Art Unit 1717 over the last five years.
This examiner's interview lift is +11.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Hoa T Le took 1,065 days on average from filing to allowance.
Hoa T Le examines applications in Art Unit 1717 in Tech Center 1700 (Chemistry & Materials).
