Listed by the USPTO as LEE, CHEUNG
Tech Center 2800 • Art Units: 2812 2826 2874 2896
This examiner grants 92% of resolved cases
LEE, CHEUNG has 1172 resolved cases and a 92.2% allowance rate. The interview lift is 4.2%, and the median time to allowance is 665 days. The profile identifies Tech Center 2800 and Art Unit 2812. The 92.2% allowance rate is the defining outcome measure, while the 4.2% interview lift indicates a smaller measured effect from interviews. The 665-day median provides a relatively short timing reference within this record and may affect continuation planning.
The primary companies are Taiwan Semiconductor Manufacturing Company, Ltd., Intel Corporation, and United Microelectronics Corp. The leading firms are Haynes and Boone, LLP (24061), THE MARBURY LAW GROUP, PLLC, and JCIPRNET. Practitioners can use the recurring semiconductor applicants and counsel to anticipate the technical setting of matters assigned to this examiner.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18774351 | BACKSIDE CONTACTS FOR SEMICONDUCTOR DEVICES | Non-Final OA | Intel Corporation |
| 18759006 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18753024 | SEMICONDUCTOR DEVICE WITH GATE CUT FEATURE AND METHOD FOR FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18420674 | PHOTONIC DEVICE AND FABRICATING METHOD THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18784531 | SEMICONDUCTOR DEVICE WITH S/D BOTTOM ISOLATION AND METHODS OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18780834 | GRAPHENE-ASSISTED LOW-RESISTANCE INTERCONNECT STRUCTURES AND METHODS OF FORMATION THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18770349 | SEMICONDUCTOR DEVICE WITH FUNNEL SHAPE SPACER AND METHODS OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18769875 | FINFETS WITH EPITAXY REGIONS HAVING MIXED WAVY AND NON-WAVY PORTIONS | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18629037 | MEMORY DEVICE INCLUDING MULTIPLICATE SOURCE LINES AND METHODS OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
| 18596501 | VERTICAL HETEROSTRUCTURE SEMICONDUCTOR MEMORY CELL AND METHODS FOR MAKING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy92.2% of resolved applications examined by Cheung Lee were allowed (1,172 resolved cases), compared with 82.1% across Art Unit 2812 over the last five years.
This examiner's interview lift is +4.2 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Cheung Lee took 665 days on average from filing to allowance.
Cheung Lee examines applications in Art Unit 2812 in Tech Center 2800 (Semiconductors, Circuits & Optics).
