Listed by the USPTO as LEE, WILSON
Tech Center 2800 • Art Units: 2152 2155 2163 2844 2845
This examiner grants 86% of resolved cases
LEE, WILSON examines in Tech Center 2800 and Art Unit 2152. The record covers 667 resolved cases and shows an allowance rate of 86.5%. The median time to allowance is 1009 days, giving practitioners a substantial timing benchmark for prosecution planning in this assignment.
Interviews show a 3.0% lift, which indicates a limited measured association in the available data. Huawei, Applied Materials, and Qualcomm are the leading listed companies. BIRCH STEWART KOLASCH & BIRCH, LANWAY IPR SERVICES, and the Law Office of Dorian Cartwright are the leading listed firms. The applicant mix centers on advanced electronics and semiconductor technology.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18960469 | ANTENNA, COMMUNICATION DEVICE, AND COMMUNICATION SYSTEM | Non-Final OA | HUAWEI TECHNOLOGIES CO., LTD. |
| 19175694 | CONTROLLING REMOTE ANTENNA SYSTEMS | Non-Final OA | QUALCOMM Incorporated |
| 18948444 | DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE | Non-Final OA | Lam Research Corporation |
| 18797492 | MIMO (MULTIPLE INPUT AND MULTIPLE OUTPUT) ANTENNA | Non-Final OA | MEDIATEK INC. |
| 19021284 | CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, INFORMATION PROCESSING METHOD, PLASMA PROCESSING DEVICE, AND INFORMATION PROCESSING DEVICE | Non-Final OA | Tokyo Electron Limited |
| 18505340 | STRATIFIED ANTENNA FOR WRIST-WEARABLE DEVICES | Final Rejection | Meta Platforms Technologies, LLC |
| 18138629 | UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE | Final Rejection | Applied Materials, Inc. |
| 19014898 | ANTENNA STRUCTURE | Final Rejection | Wistron NeWeb Corporation |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy86.5% of resolved applications examined by Wilson Lee were allowed (667 resolved cases), compared with 64.7% across Art Unit 2152 over the last five years.
This examiner's interview lift is +3.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Wilson Lee took 1,009 days on average from filing to allowance.
Wilson Lee examines applications in Art Unit 2152 in Tech Center 2800 (Semiconductors, Circuits & Optics).
