Listed by the USPTO as LOHAKARE, PRATIKSHA JAYANT
Tech Center 3600 • Art Units: 2818 2894 3652
This examiner grants 83% of resolved cases
LOHAKARE, PRATIKSHA JAYANT is assigned to Tech Center 3600 and Art Unit 2818. The profile covers 99 resolved cases, with an 82.8% allowance rate and a median of 1170 days to allowance. Interview lift is 13.9%, indicating a positive association between interviews and allowance outcomes.
Samsung Electronics Co., Ltd., Samsung Display Co., Ltd., and Taiwan Semiconductor Manufacturing Company, Ltd. are the listed companies. Alliance IP, LLC - Intel, BIRCH STEWART KOLASCH & BIRCH, LLP, and CANTOR COLBURN LLP are the associated firms. The high allowance rate is favorable, although the limited case volume means practitioners should use the profile as a directional reference.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18636463 | METHODS OF DICING WAFERS HAVING ARRAYS OF SEMICONDUCTOR CHIPS THEREIN AND SEMICONDUCTOR CHIPS FORMED THEREBY | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18441681 | IMAGE SENSOR AND METHOD OF FABRICATING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 18486831 | SEMICONDUCTOR PACKAGES | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18398432 | DISPLAY DEVICE | Non-Final OA | LG Display Co., Ltd. |
| 18734446 | DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18408399 | DISPLAY PANEL AND DEPOSITION APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 17831418 | DISPLAY APPARATUS HAVING A REFRACTIVE LAYER | Non-Final OA | Samsung Display Co., Ltd. |
| 18282801 | Display Substrate and Preparing Method Therefor, and Display Apparatus | Non-Final OA | BOE Technology Group Co., Ltd. |
| 18147457 | ARCHITECTURES AND METHODS FOR METAL LAMINATION ON A GLASS LAYER | Final Rejection | Intel Corporation |
| 18539817 | DISPLAY DEVICE | Final Rejection | InnoLux Corporation |
| 18253196 | LOW RESISTANCE PULSED CVD TUNGSTEN | Non-Final OA | Lam Research Corporation |
| 18607622 | SEMICONDUCTOR MANUFACTURING APPARATUS | Final Rejection | Mitsubishi Electric Corporation |
| 17889694 | SEMICONDUCTOR ISOLATION DEVICE AND METHOD | Non-Final OA | Micron Technology, Inc. |
| 18596003 | Chip Die Substrate with Edge-Mounted Capacitors | Non-Final OA | NVIDIA Corporation |
| 18778289 | SEMICONDUCTOR MEMORY DEVICE AND A MANUFACTURING METHOD OF THE SEMICONDUCTOR MEMORY DEVICE | Non-Final OA | SK hynix Inc. |
| 18399400 | SEMICONDUCTOR STRUCTURE, FORMING METHOD THEREOF AND SEMICONDUCTOR DEVICE | Final Rejection | Yangtze Memory Technologies Co., Ltd. |
| 18786591 | TRANSISTOR, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD OF HBNC LAYER | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18662286 | SEMICONDUCTOR DEVICE INCLUDING SOURCE/DRAIN UNIT WITH TUNNEL LAYER AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18786529 | SEMICONDUCTOR DEVICE HAVING A MULTILAYER SOURCE/DRAIN REGION AND METHODS OF MANUFACTURE | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18127736 | SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING SAME | Final Rejection | Semiconductor Manufacturing International (Shanghai) Corporation |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy82.8% of resolved applications examined by Pratiksha Jayant Lohakare were allowed (99 resolved cases), compared with 85.2% across Art Unit 2818 over the last five years.
This examiner's interview lift is +13.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Pratiksha Jayant Lohakare took 1,170 days on average from filing to allowance.
Pratiksha Jayant Lohakare examines applications in Art Unit 2818 in Tech Center 3600 (Transportation, E-Commerce & Mechanical Systems).
