Listed by the USPTO as MCCORMACK, JASON L
Tech Center 2800 • Art Units: 2881
This examiner grants 85% of resolved cases
MCCORMACK, JASON L handles cases in Tech Center 2800 and Art Unit 2881. His profile covers 1060 resolved cases, with an 84.7% allowance rate and a median of 785 days to allowance. The large record and high allowance rate show a consistent favorable outcome pattern in the available data, while the median provides a relatively direct planning reference for prosecution duration.
The interview lift is 8.1%, indicating a positive association between interviews and allowance outcomes. The listed companies are ASML Holding N.V., Board of Regents of the University of Texas System, and Carl Zeiss Microscopy GmbH. The associated firms are Meunier Carlin & Curfman LLC, Westborough IP Group, LLC, and Buchanan Ingersoll & Rooney PC. These recurring organizations may provide useful experience signals for prospective counsel.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18366322 | APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18522600 | METHOD AND SYSTEM FOR MANIPULATING PARTICLE BY USING OPTICAL TWEEZER | Non-Final OA | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
| 18857632 | ION GUIDE AND MASS SPECTROMETER | Non-Final OA | HITACHI HIGH-TECH CORPORATION |
| 18927064 | COMPACT BEAM PROCESSING SYSTEM HAVING IN-SITU IMAGING METROLOGY | Non-Final OA | Applied Materials, Inc. |
| 18781599 | Ion Beam Etching Apparatus And Method | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18360197 | Fastening an object to a manipulator and/or to an object holder in a particle beam apparatus | Final Rejection | Carl Zeiss Microscopy GmbH |
| 17974702 | METHOD FOR PRODUCING A SAMPLE ON AN OBJECT, COMPUTER PROGRAM PRODUCT, AND MATERIAL PROCESSING DEVICE FOR CARRYING OUT THE METHOD | Non-Final OA | Carl Zeiss Microscopy GmbH |
| 18866471 | DROPLET GENERATOR NOZZLE | Non-Final OA | ASML Netherlands B.V. |
| 18911806 | CHARGED PARTICLE BEAM APPARATUS WITH MULTIPLE DETECTORS AND METHODS FOR IMAGING | Non-Final OA | ASML Netherlands B.V. |
| 18776207 | INSPECTION APPARATUS AND METHOD | Non-Final OA | ASML NETHERLANDS B.V. |
| 18320157 | INSPECTION METHOD AND INSPECTION TOOL | Non-Final OA | ASML Netherlands B.V. |
| 17771761 | CHARGED PARTICLE INSPECTION SYSTEM AND METHOD USING MULTI-WAVELENGTH CHARGE CONTROLLERS | Final Rejection | ASML NETHERLANDS B.V. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy84.7% of resolved applications examined by Jason L Mccormack were allowed (1,060 resolved cases), compared with 69.6% across Art Unit 2881 over the last five years.
This examiner's interview lift is +8.1 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Jason L Mccormack took 785 days on average from filing to allowance.
Jason L Mccormack examines applications in Art Unit 2881 in Tech Center 2800 (Semiconductors, Circuits & Optics).
