Prosecution Insights
Last updated: October 01, 2026

Examiner: MELLOTT, JAMES M

Tech Center 2800 • Art Units: 1712 1718 1759 1794 2853

This examiner grants 51% of resolved cases

Analysis

James M. Mellott is a patent examiner in Tech Center 2800, working within Art Unit 1712. The examiner has 568 resolved cases and an allowance rate of 51.1 percent. This 51.1 percent rate reflects the proportion of applications that reach a grant. For the 568 cases handled, this data provides a basis for understanding the probability of success during the examination process. The volume of resolved cases reflects the examiner's experience within Tech Center 2800.

The median days to allowance for this examiner is 1225. This 1225-day timeline represents the duration for an application to move from filing to a grant. Applicants should consider this period when planning their patent strategy and resource allocation. The volume of 568 resolved cases suggests that this duration is a consistent aspect of the examiner's workflow in Art Unit 1712. This median provides a specific metric for evaluating the expected length of prosecution.

The data shows an interview lift of 44.2 percent. This 44.2 percent lift represents the change in the likelihood of allowance when an interview is conducted. It suggests that direct communication is a method for addressing the probability of a grant. For practitioners, utilizing an interview is an option to navigate the prosecution process and achieve a positive outcome. Practitioners can use this lift to evaluate the potential benefits of direct engagement.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

51.1%
Allow Rate
-16.9% vs TC avg
610
Total Applications
+44.2%
Interview Lift
1225
Avg Prosecution Days
Based on 568 resolved cases, 2023–2026

Rejection Statute Breakdown

1.0%
§101 Eligibility
15.0%
§102 Novelty
53.0%
§103 Obviousness
24.5%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18420055 INKJET PRINTING APPARATUS AND INKJET PRINTING METHOD USING THE SAME Non-Final OA Samsung Display Co., LTD.
18509692 MASK, MASK ASSEMBLY INCLUDING THE MASK, AND METHDO OF FABRICATING DISPLAY DEVICE Non-Final OA Samsung Display Co., LTD.
18348507 WINDOW REINFORCING APPARATUS Non-Final OA Samsung Display Co., Ltd.
18626933 PAINTING METHOD Final Rejection ASUSTEK COMPUTER INC.
18277516 Electrode Sheet Drying Apparatus, Electrode Sheet Manufacturing System Comprising Same, and Electrode Sheet Drying Method Final Rejection LG Energy Solution, Ltd.
19251984 METHODS FOR FORMING A DOPED HIGH-K LAYER ON A SUBSTRATE Final Rejection ASM IP Holding B.V.
16497051 METHOD OF 3D-PRINTING PRODUCING A COMPONENT FOR USE IN A LIGHTING DEVICE Final Rejection SIGNIFY HOLDING B.V.
18438393 ELECTRODE PLATE MANUFACTURING APPARATUS AND ELECTRODE PLATE MANUFACTURING METHOD Final Rejection CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
18112803 FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAPHY AND AREA SELECTIVE DEPOSITION Non-Final OA International Business Machines Corporation
18735203 VACUUM COATING APPARATUS, CONTROL DEVICE AND METHOD FOR INFLUENCING A RATE AT WHICH A COATING MATERIAL IS EMITTED Non-Final OA VON ARDENNE Asset GmbH & Co. KG
18786836 DUAL AMPOULE SEPARATOR PLATE AND METHOD Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18789812 WAFER TREATMENT SYSTEM AND METHOD OF TREATING WAFER Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
17183138 SENSOR TECHNOLOGY INTEGRATION INTO COATING TRACK Final Rejection Tokyo Electron Limited
18839957 PROCESS FOR PRODUCING A COATED OBJECT COMPRISING COATING LAYERS HAVING ADJUSTABLE PROPERTIES Non-Final OA BASF COATINGS GMBH
19132073 FILM-FORMING AUXILIARY AGENT FOR CHEMICAL VAPOR DEPOSITION, COATING SOLUTION FOR CHEMICAL VAPOR DEPOSITION, METAL OXIDE FILM, AND FILM-FORMING METHOD FOR METAL OXIDE FILM Non-Final OA NOF CORPORATION
18657554 Tamper-Evident Label Non-Final OA Iconex LLC
18702949 GAS BARRIER LAMINATE Non-Final OA Rohm and Haas Company
18866416 PLASMA-ENHANCED DEPOSITION REACTOR Non-Final OA CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
18866108 CAPACITIVELY COUPLED PLASMA-ENHANCED ATOMIC LAYER DEPOSITION METHOD Final Rejection CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
18720073 Method For Applying A Polymer Sublayer For Reinforcing The Mechanical Resistance, In Particular To Heat, Of Fluorinated Coatings Non-Final OA SEB S.A.
17737995 WATER-DISPERSIBLE ARTICLE INCLUDING WATER-DISPERSIBLE CORE CONSTRUCTION Final Rejection MONOSOL, LLC

Facing This Examiner?

IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.

Build Your Strategy

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month