Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1713 2877
This examiner grants 62% of resolved cases
Alexandria Arellano Mendoza is an examiner in Tech Center 2800, Art Unit 1713. With 26 resolved cases, the allowance rate is 61.5%. This provides a moderate probability of success for applicants compared to lower-rate dockets. The interview lift of 28.3% suggests that engaging with the examiner is highly beneficial. The median days to allowance is 930, which serves as a benchmark for prosecution timing.
Practitioners should consider the 28.3% lift as a primary tactic for advancing prosecution in this art unit. The 61.5% allowance rate indicates that while rejections occur, they can often be overcome. With 26 resolved cases, the 930-day median pendency is an important metric for managing client expectations. In Art Unit 1713, the data supports a strategy that emphasizes direct communication to take advantage of the significant interview lift.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18836628 | Device for Measuring Temperature and Thickness of Film and Measurement Method Using Same | Final Rejection | LG Chem, Ltd. |
| 18847777 | SPECTROSCOPIC ANALYSIS AND PARTICLE IDENTIFICATION USING OUT-OF-PLANE IMAGING OF MULTIMODE-INTERFEROMETER WAVEGUIDE SCATTERING | Final Rejection | The Regents of the University of California |
| 17829103 | CARGO CONTAINER SENSOR | Non-Final OA | GOODRICH CORPORATION |
| 18310412 | ULTRAHIGH-SPEED MULTI-PARAMETRIC PHOTOACOUSTIC MICROSCOPY BASED ON A THIN-FILM OPTICAL-ACOUSTIC COMBINER | Non-Final OA | Washington University |
| 17988036 | APPARATUS FOR MEASURING OPTOFLUIDIC DROPLET FLUORESCENCE AND MANUFACTURING METHOD THEREOF | Final Rejection | ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
| 18505810 | SUB-MILLISECOND OPTICAL DETECTION OF PULSED PLASMA PROCESSES | Non-Final OA | Tokyo Electron Limited |
| 18648644 | OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUCH AN OPTICAL SYSTEM | Non-Final OA | Carl Zeiss SMT GmbH |
| 18691002 | SOURCE SELECTION MODULE AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES | Non-Final OA | ASML NETHERLANDS B.V. |
| 18918276 | DEPOSITION MONITOR FOR SEMICONDUCTOR MANUFACTURING SYSTEM | Non-Final OA | Axcelis Technologies, Inc. |
| 19100510 | DEFLECTOMETRY METHOD AND ASSOCIATED SYSTEM | Non-Final OA | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE |
| 18887461 | Electrical Performance Prediction Based On Structural Measurements Of Partially Fabricated Semiconductor Devices | Non-Final OA | KLA Corporation |
| 18693003 | METHOD FOR CALIBRATING A SPECTROMETER DEVICE | Final Rejection | TRINAMIX GMBH |
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