Listed by the USPTO as MILLER, ALEXANDER MICHAEL
Tech Center 4100 • Art Units: 2898 4100
This examiner grants 86% of resolved cases
MILLER, ALEXANDER MICHAEL practices in tech center 4100 and art unit 2898. The available record contains 7 resolved cases, an allowance rate of 85.7%, and a median of 1259 days to allowance. The interview lift is 33.3%, which suggests that interviews may be useful, although the limited case volume makes the measured pattern preliminary.
The listed companies are Samsung Electronics Co., Ltd., Taiwan Semiconductor Manufacturing Company, Ltd., and International Business Machines Corporation. The listed firms are BIRCH STEWART KOLASCH & BIRCH, LLP, FISH & RICHARDSON P.C. (TC), and Harrity & Harrity , LLP. Practitioners should treat the allowance and interview figures as early signals and validate them through matter-specific prosecution experience.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18677392 | SEMICONDUCTOR PACKAGE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18517126 | SEMICONDUCTOR MEMORY DEVICES | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18468992 | SEMICONDUCTOR PACKAGES | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18242628 | MANUFACTURING METHOD OF INTEGRATED CIRCUIT DEVICE | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18239191 | METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18150415 | SEMICONDUCTOR DEVICE AND ELECTRONIC SYSTEM INCLUDING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18060037 | METHOD FOR PATTERNING AND REDUCING A THICKNESS OF A PHOTORESIST PATTERN IN A SEMICONDUCTOR DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18369226 | POWER SEMICONDUCTOR DEVICE AND POWER CONVERTER | Final Rejection | LX SEMICON CO., LTD. |
| 18235797 | LASER ANNEALING METHOD AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME | Final Rejection | SAMSUNG DISPLAY CO., LTD. |
| 18041870 | SEMICONDUCTOR DEVICE, SEMICONDUCTOR MODULE, AND WIRELESS COMMUNICATION APPARATUS | Non-Final OA | SONY GROUP CORPORATION |
| 18604744 | LIGHT-EMITTING DEVICE, DISPLAY DEVICE, AND ELECTRONIC APPARATUS | Non-Final OA | SEIKO EPSON CORPORATION |
| 17955245 | SOLID STATE ELECTROLYTES FOR BACKEND SUPERCAPACITORS | Final Rejection | Intel Corporation |
| 17288675 | SEMICONDUCTOR DEVICE | Non-Final OA | Semiconductor Energy Laboratory Co., Ltd. |
| 18279573 | LIGHT-EMITTING ELEMENT, DISPLAY DEVICE, METHOD FOR MANUFACTURING LIGHT-EMITTING ELEMENT, METHOD FOR MANUFACTURING DISPLAY DEVICE, METHOD FOR MANUFACTURING QUANTUM DOT COLLOIDAL SOLUTION, AND QUANTUM DOT COLLOIDAL SOLUTION | Final Rejection | SHARP KABUSHIKI KAISHA |
| 18527716 | METHOD OF MANUFACTURING SEMICONDUCTOR OPTICAL DEVICE | Non-Final OA | Sumitomo Electric Industries, Ltd. |
| 18362936 | Converter Package with Integrated Inductor | Final Rejection | Texas Instruments Incorporated |
| 18371015 | SEMICONDUCTOR DEVICE WITH OFFSET GATE CONTACT | Final Rejection | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18468977 | NANOSHEET DEVICE WITH ALIGNED ISOLATION AND EPITAXIAL GROWTH | Final Rejection | International Business Machines Corporation |
| 17552429 | SELECTIVE ENCAPSULATION OF MEMRISTIVE ELEMENT | Non-Final OA | International Business Machines Corporation |
| 18376136 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18240033 | SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18151843 | DUAL BAND FAN OUT DEVICE AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18492240 | PROCESSING METHOD OF BONDED WAFER | Final Rejection | DISCO CORPORATION |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy85.7% of resolved applications examined by Alexander Michael Miller were allowed (7 resolved cases), compared with 80.2% across Art Unit 2898 over the last five years.
This examiner's interview lift is +33.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Alexander Michael Miller took 1,259 days on average from filing to allowance.
Alexander Michael Miller examines applications in Art Unit 2898 in Tech Center 4100.
