Listed by the USPTO as MILLER, JR, JOSEPH ALBERT
Tech Center 3700 • Art Units: 1712 1713 1715 1716 1792 2811 2818 2891 2892 2893
This examiner grants 68% of resolved cases
MILLER, JR, JOSEPH ALBERT is assigned to tech center 3700 and art unit 1712. His record contains 1276 resolved cases, with an allowance rate of 68.5% and a median of 1024 days to allowance. The 16.2% interview lift indicates a positive but measured association, supporting interviews when they address defined prosecution issues.
The primary companies are Applied Materials Inc., Samsung Electronics Co., Ltd., and Kokusai Electric Corporation. The leading firms are FISH & RICHARDSON P.C. (TC), VOLPE KOENIG, and Knobbe, Martens, Olson & Bear, LLP. Counsel can use the substantial record to develop realistic expectations for allowance and to integrate interviews into a broader written-response plan.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18909746 | PLASMA DEPOSITION APPARATUS AND PLASMA DEPOSITION METHOD | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18640181 | PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO. LTD. |
| 18636099 | PLASMA DIAGNOSTIC DEVICE, AND SEMICONDUCTOR PROCESSING EQUIPMENT USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18425048 | DEPOSITION SYSTEM AND PROCESSING SYSTEM | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18931963 | MANUFACTURE OF SURFACE RELIEF STRUCTURES | Non-Final OA | Snap Inc. |
| 18452725 | SUBSTRATE PROCESSING APPARATUS | Final Rejection | ASM IP Holding B.V. |
| 18074629 | REMOTE SOLID SOURCE REACTANT DELIVERY SYSTEMS FOR VAPOR DEPOSITION REACTORS | Non-Final OA | ASM IP Holding B.V. |
| 18458088 | APPARATUS AND METHODS FOR COMBINATORIAL MATERIAL SCREENING AND DISCOVERY | Final Rejection | The University of British Columbia |
| 18940332 | SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Kioxia Corporation |
| 18690810 | PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM | Non-Final OA | Tokyo Electron Limited |
| 18907224 | Grounded Slit Door for Substrate Process Chamber | Non-Final OA | Applied Materials, Inc. |
| 18895005 | EXHAUST SYSTEM CONTROL | Non-Final OA | Applied Materials, Inc. |
| 18666216 | DOPED TUNGSTEN CARBIDE LOW-K ETCH HARD MASK | Non-Final OA | Applied Materials, Inc. |
| 18654221 | HIGH-THROUGHPUT PLASMA LID FOR SEMICONDUCTOR MANUFACTURING PROCESSING CHAMBERS | Final Rejection | Applied Materials, Inc. |
| 18589392 | BIASED OR FLOATING PROCESS SHIELD TO REDUCE ION LOSS TO CONTROL FILM DEPOSITION AND IMPROVE STEP COVERAGE | Final Rejection | Applied Materials, Inc. |
| 18367321 | MICROWAVE ANNEALING FOR LOW THERMAL BUDGET APPLICATIONS | Final Rejection | Applied Materials, Inc. |
| 18613747 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 18368096 | SUBSTRATE PROCESSING APPARATUS, METHOD OF CLEANING, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | Final Rejection | KOKUSAI ELECTRIC CORPORATION |
| 18463435 | SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS | Final Rejection | Kokusai Electric Corporation |
| 18336524 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | Final Rejection | Kokusai Electric Corporation |
| 18938634 | SHOWER HEAD ASSEMBLY AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME | Non-Final OA | SEMES CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy68.5% of resolved applications examined by Jr, Joseph Albert Miller were allowed (1,276 resolved cases), compared with 43.3% across Art Unit 1712 over the last five years.
This examiner's interview lift is +16.2 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Jr, Joseph Albert Miller took 1,024 days on average from filing to allowance.
Jr, Joseph Albert Miller examines applications in Art Unit 1712 in Tech Center 3700 (Medical Devices & Mechanical Engineering).
