Listed by the USPTO as PARK, SAMUEL
Tech Center 4100 • Art Units: 2817 2818 4100
This examiner grants 85% of resolved cases
This record covers 488 resolved cases in Tech Center 4100 and Art Unit 2817. The allowance rate is 84.6%, with a median of 933 days to allowance. Interview lift is 24.0%, showing a positive association that may make interviews useful when technical issues remain disputed.
The leading companies are LG Display Co., Ltd., Samsung Display Co., Ltd., and Applied Materials Inc. The leading firms are CANTOR COLBURN LLP, Chiesa Shahinian & Giantomasi PC, and CONLEY ROSE, P.C. The data supports a favorable allowance outlook combined with deliberate management of the 933-day median.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18898397 | Display Device and Method for Manufacturing the Same | Non-Final OA | LG Display Co., Ltd. |
| 18898445 | Display Device and Method for Manufacturing the Same | Non-Final OA | LG Display Co., Ltd. |
| 18884672 | Display Device | Non-Final OA | LG Display Co., Ltd. |
| 18808722 | METHOD OF MANUFACTURING DISPLAY DEVICE | Non-Final OA | Samsung Display Co., Ltd. |
| 18774484 | DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18769129 | IMAGE PICKUP ELEMENT, STACKED IMAGE PICKUP ELEMENT, AND SOLID IMAGE PICKUP APPARATUS | Final Rejection | SONY SEMICONDUCTOR SOLUTIONS CORPORATION |
| 18838487 | DISPLAY SUBSTRATE AND DISPLAY APPARATUS | Non-Final OA | BOE Technology Group Co., Ltd. |
| 18423110 | SEMICONDUCTOR MEMORY DEVICE | Non-Final OA | Kioxia Corporation |
| 18417485 | INTERPOSER | Final Rejection | Murata Manufacturing Co., Ltd. |
| 18353211 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING ELECTROSTATIC DISCHARGE PROTECTION CIRCUIT | Final Rejection | SK hynix Inc. |
| 18533721 | SEMICONDUCTOR DEVICE | Final Rejection | ROHM CO., LTD. |
| 18590111 | MICROWAVE ASSISTED PASSIVATION LAYER REMOVAL | Non-Final OA | Applied Materials, Inc. |
| 18378850 | SACRIFICIAL SOURCE/DRAIN FOR METALLIC SOURCE/DRAIN HORIZONTAL GATE ALL AROUND ARCHITECTURE | Non-Final OA | Applied Materials, Inc. |
| 18348741 | ELECTROSTATIC DISCHARGE IN GALLIUM NITRIDE DEVICES | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18790227 | SINGULATION AND BONDING METHODS AND STRUCTURES FORMED THEREBY | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy84.6% of resolved applications examined by Samuel Park were allowed (488 resolved cases), compared with 81.7% across Art Unit 2817 over the last five years.
This examiner's interview lift is +24.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Samuel Park took 933 days on average from filing to allowance.
Samuel Park examines applications in Art Unit 2817 in Tech Center 4100.
