Listed by the USPTO as REYES, JOSHUA NATHANIEL PI
Tech Center 3700 • Art Units: 1713 1718 2893 3723
This examiner grants 42% of resolved cases
REYES, JOSHUA NATHANIEL PI works in tech center 3700 and art unit 1713. The record contains 71 resolved cases, a 42.3% allowance rate, and a median of 1358 days to allowance. The interview lift is 50.5%, showing a strong positive association between interviews and allowance outcomes compared with the overall profile result.
The listed companies are Applied Materials Inc., Tokyo Electron Limited, and ASM IP Holding B.V. The listed firms are Snell & Wilmer (ASM IP Holding B.V.), Li & Cai Intellectual Property(USA) office, and Xsensus. Practitioners should consider interviews a central part of prosecution strategy, particularly given the lower overall allowance rate. The limited case record means the measured lift should be applied with judgment, while the median pendency supports early planning.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18774793 | METHOD AND SYSTEM FOR MONITORING SUBSTRATE PROCESSING APPARATUS | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18598037 | RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18328298 | CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18421655 | APPARATUS FOR MANUFACTURING DISPLAY APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 18517837 | VAPOR PHASE PRECURSOR DELIVERY SYSTEM | Non-Final OA | ASM IP Holding B.V. |
| 18179187 | SEMICONDUCTOR PROCESSING SYSTEM WITH GAS LINE FOR TRANSPORTING EXCITED SPECIES AND RELATED METHODS | Non-Final OA | ASM IP HOLDING B.V. |
| 17857344 | SUBSTRATE SUPPORT STRUCTURES AND METHODS OF MAKING SUBSTRATE SUPPORT STRUCTURES | Final Rejection | ASM IP Holding B.V. |
| 17840870 | SUSCEPTOR CLEANING | Non-Final OA | ASM IP Holding B.V. |
| 18452933 | REMOVING SCALE FROM A PIPELINE | Final Rejection | Saudi Arabian Oil Company |
| 18800410 | HIGH POWER ELECTROSTATIC CHUCK WITH FEATURES PREVENTING HE HOLE LIGHT-UP/ARCING | Non-Final OA | Lam Research Corporation |
| 17915573 | EDGE RING FOR LOCALIZED DELIVERY OF TUNING GAS | Final Rejection | LAM RESEARCH CORPORATION |
| 17612536 | SHOWERHEAD INSERT FOR UNIFORMITY TUNING | Non-Final OA | Lam Research Corporation |
| 18605275 | PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18249552 | PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18298829 | Method and System for Plasma Processing | Non-Final OA | Tokyo Electron Limited |
| 17848596 | PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT | Final Rejection | Tokyo Electron Limited |
| 17757781 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Final Rejection | Tokyo Electron Limited |
| 17433693 | PLASMA PROCESSING APPARATUS | Final Rejection | Hitachi High-Tech Corporation |
| 18524955 | HYBRID SEAL FOR SEMICONDUCTOR PROCESSING CHAMBERS | Non-Final OA | Applied Materials, Inc. |
| 18228393 | CLUSTER PROCESSING SYSTEM FOR FORMING A METAL CONTAINING MATERIAL | Final Rejection | Applied Materials, Inc. |
| 18138733 | MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING | Final Rejection | Applied Materials, Inc. |
| 17561085 | BASE PLATE FOR HEATER PEDESTAL | Non-Final OA | Applied Materials, Inc. |
| 17510111 | HORIZONTAL BUFFING MODULE | Final Rejection | Applied Materials, Inc. |
| 17156957 | METHODS AND APPARATUS FOR TUNING SEMICONDUCTOR PROCESSES | Final Rejection | APPLIED MATERIALS, INC. |
| 17063366 | BEVEL BACKSIDE DEPOSITION ELIMINATION | Final Rejection | Applied Materials, Inc. |
| 18609531 | SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 17846166 | APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE | Non-Final OA | SEMES CO., LTD. |
| 17563252 | SUBSTRATE TREATING APPARATUS | Final Rejection | SEMES CO., LTD. |
| 17315322 | SUBSTRATE TREATING APPARATUS | Non-Final OA | SEMES CO., LTD. |
| 18584816 | BIAS SUPPLY WITH RESONANT SWITCHING | Non-Final OA | Advanced Energy Industries, Inc. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy42.3% of resolved applications examined by Joshua Nathaniel Pi Reyes were allowed (71 resolved cases), compared with 62.4% across Art Unit 1713 over the last five years.
This examiner's interview lift is +50.5 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Joshua Nathaniel Pi Reyes took 1,358 days on average from filing to allowance.
Joshua Nathaniel Pi Reyes examines applications in Art Unit 1713 in Tech Center 3700 (Medical Devices & Mechanical Engineering).
